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Diamond and Diamond-like Films and Coatings pp 549–554Cite as

Deposition Experiments with Separated Atomic Hydrogen and CH4 Sources

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Part of the book series: NATO ASI Series ((NSSB,volume 266))

Abstract

The mechanism of low pressure diamond deposition is a matter of high interest not only for researchers but also for those who want to apply these films. Only a deep insight into the deposition process will allow the adequate design (eg. transparency, graining etc.) of diamond films for the various fields of application.

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Authors and Affiliations

  1. Institut für Physikalische Chemie, Universität Hamburg, Bundesstr. 45, 2000, Hamburg 13, Germany

    Pierre Joeris & Carsten Benndorf

Authors
  1. Pierre Joeris
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  2. Carsten Benndorf
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Editor information

Editors and Affiliations

  1. Metals and Ceramics Division, Oak Ridge National Laboratory, P.O. Box 2008, 37831-6093, Oak Ridge, Tennessee, USA

    Robert E. Clausing

  2. Metals and Ceramics Division, Oak Ridge National Laboratory, P.O. Box 2008, 37831-6118, Oak Ridge, Tennessee, USA

    Linda L. Horton

  3. Department of Chemical Engineering, Case Western Reserve University, 44106, Cleveland, Ohio, USA

    John C. Angus

  4. Fraunhofer Institut für Angewandte Festkörperphysik, Tullastrasse 72, D-7800, Freiburg, Germany

    Peter Koidl

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© 1991 Plenum Press, New York

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Joeris, P., Benndorf, C. (1991). Deposition Experiments with Separated Atomic Hydrogen and CH4 Sources. In: Clausing, R.E., Horton, L.L., Angus, J.C., Koidl, P. (eds) Diamond and Diamond-like Films and Coatings. NATO ASI Series, vol 266. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-5967-8_35

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  • DOI: https://doi.org/10.1007/978-1-4684-5967-8_35

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-5969-2

  • Online ISBN: 978-1-4684-5967-8

  • eBook Packages: Springer Book Archive

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