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Structural evolution during lithiation of sputtered V2O5 films

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Abstract

Li x VO2.5 films were made by reactive dc magnetron sputtering followed by galvanostatic treatment in LiClO4. Structural evolution forx increasing from zero to ≈ 1, studied by X-ray diffraction, was consistent with a VO5-based layer configuration with progressively increasing layer separation and puckering. Two-phase behavior was found forx>1.

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References

  1. K. West, B. Zachau-Christiansen, T. Jacobsen, S. Skaarup: Electrochim. Acta38, 1215 (1993); J. Power Sources43–44, 127 (1993)

    Google Scholar 

  2. C.G. Granqvist:Handbook of Inorganic Electrochromic Materials (Elsevier, Amsterdam 1994)

    Google Scholar 

  3. A.M. Andersson, C.G. Granqvist, J.R. Stevens: Appl. Opt.28, 3295 (1989)

    Google Scholar 

  4. P. Baudry, M.A. Aegerter, D. Deroo, B. Valla: J. Electrochem. Soc.138, 460 (1991)

    Google Scholar 

  5. K. Nagase, Y. Shimizu, K. Miura, N. Yamazoe: Appl. Phys. Lett.61, 243 (1992)

    Google Scholar 

  6. Y. Shimizu, K. Nagase, N. Miura, N. Yamazoe: Solid State Ionics53–56, 490 (1992)

    Google Scholar 

  7. C.G. Granqvist: Appl. Phys. A57, 3 (1993)

    Google Scholar 

  8. H.G. Bachmann, F.R. Ahmed, W.H. Barnes: Z. Kristallogr.115, 110 (1961)

    Google Scholar 

  9. J. Galy: J. Solid State Chem.100, 229 (1992)

    Google Scholar 

  10. B.Y. Liaw, I.D. Raistrick, R.A. Huggins: Solid State Ionics45, 323 (1991)

    Google Scholar 

  11. J.M. Cocciantelli, J.P. Doumerc, M. Pouchard, M. Broussely, J. Labat: J. Power Sources34, 103 (1991)

    Google Scholar 

  12. C. Delmas, S. Bréthes, M. Ménétrier: J. Power Sources34, 113 (1991)

    Google Scholar 

  13. M.V. Ptitsyn, Ya.R. Rakhmilevich, K.I. Tikhonov, A.L. Rotinyan: Elektrokhim.16, 740 (1980) [Soviet Electrochem.16, 640 (1980)]

    Google Scholar 

  14. M.V. Ptitsyn, K.I. Tikhonov, A.L. Rotinyan: Elektrokhim.17, 1558 (1981) [Soviet Electrochem.17 1297 (1981)]

    Google Scholar 

  15. ASTM Cards 30–40, 36–41, and 38–192

Download references

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Author notes

  1. A. Talledo

    Present address: Facultad de Ciencias, Universidad Nacional de Ingenieria, Nacional Apartado 31, 139, Lima 31, Peru

Authors and Affiliations

  1. Physics Department, Chalmers University of Technology and University of Gothenburg, S-412 96, Gothenburg, Sweden

    A. Talledo

  2. Department of Technology, Uppsala University, P.O. Box 534, S-751 21, Uppsala, Sweden

    C. G. Granqvist

Authors
  1. A. Talledo
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  2. C. G. Granqvist
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Talledo, A., Granqvist, C.G. Structural evolution during lithiation of sputtered V2O5 films. Appl. Phys. A 60, 521–522 (1995). https://doi.org/10.1007/BF01538779

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