Application of the three-state lithography model for grayscale lithography

Bassem Badawi; Christoph Kutter

doi:10.1117/12.2641182

1 November 2022 Application of the three-state lithography model for grayscale lithography

Bassem Badawi, Christoph Kutter

Proceedings Volume 12472, 37th European Mask and Lithography Conference; 124720D (2022) https://doi.org/10.1117/12.2641182
Event: 37th European Mask and Lithography Conference, 2022, Leuven, Belgium

Abstract

In this work, we focus on the application of the "three-state lithography model" developed for the production of 3D-topographies in photoresist through grayscale lithography. We demonstrate in detail how the variables of the model are determined and optimized in a parameter definition procedure. The principle work ow for a automated mask generation is shown on a pyramid sample structure. Additionally, we tested a top and bottom anti-reflective coating for the use of surface smoothening. Experiments reveal bottom anti-reflective coating as method of choice to smoothen the surfaces on manufactured 3D-topographies.

Citation Download Citation

Bassem Badawi and Christoph Kutter "Application of the three-state lithography model for grayscale lithography", Proc. SPIE 12472, 37th European Mask and Lithography Conference, 124720D (1 November 2022); https://doi.org/10.1117/12.2641182

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