Abstract
Of the various compound semiconductors, the III–V compounds have properties most similar to the group IV elemental semiconductors. Like Si and Ge, the III–V compounds may readily be doped as n- orp-type to form p-n junctions, the most useful and widespread application of semiconductors. They are 1-to-l chemical compounds of the group III elements B, Al, Ga, and In with the group V elements N, P, As, and Sb. The III–V compounds are tetrahedrally coordinated, and the majority crystallize in the zinc-blende structure illustrated in figure 6.1 for GaAs. The zinc-blende structure is the diamond lattice of Si or Ge, but with group III and V atoms occupying adjacent lattice sites. Although the diamond and zinc-blende structures are similar, the differences in lattice constant, the presence or absence of d-shell electrons, and the ionicity of the III–V compounds result in significant differences in the band structure [1]. The varied band structures and large range of energy gaps possible with the III–V compounds have led to many potential applications. The crystal structure, lattice constant, type of energy gap, and the room temperature energy gap are summarized in Table 6.1 for the elemental semiconductors Si and Ge and the III–V compound semiconductors.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
J. A. Van Vechten, Phys. Rev., 187, 1007 (1969)
J. J. Baranowski, V. J. Higgins, C. K. Kim and L. D. Armstrong, Microwave J., 12, 71 (1969)
K. L. Lawley, J. Electrochem. Soc. 113, 240 (1966)
A. S. Grove, A. Roder and C. T. Sah, J. appl. Phys., 36, 802 (1965)
S. M. Hu, J. appl. Phys., 39, 3844 (1968)
J. I. Pankove and M. Massoulie, Electron Div. Abstr., Spring Meeting Electrochem. Soc. Los Angeles, p. 71 (1962)
R. J. Keyes and T. M. Quist, Proc. IRE, 50, 1822 (1962)
M. Gershenzon and R. M. Mikulyak, IRE Trans. Electron Devices, ED9, 503 (1962)
D. N. Nasledov, A. A. Rogachev, S. M. Ryvkin and B. V. Tsarenkov, Soviet Phys. solid St., 4, 782 (1962)
D. N. Nasledov, A. A. Rogachev, S. M. Ryvkin and B. V. Tsarenkov translated from Fiz. Tverd. Tela, 4, 1062 (1962)
M. I. Nathan, W. P. Dumke, G. Burns, F. H. Dill, Jr. and G. Lasher, Appl. Phys. Lett., 1, 62 (1962)
R. N. Hall, G. E. Fenner, J. D. Kingsley, T. J. Soltys and R. O. Carlson, Phys. Rev. Lett., 9, 366(1962)
F. A. Cunnell and C. H. Gooch, J. Phys. Chem. Solids, 15, 127 (1960)
J. W. Allen and F. A. Cunnell, Nature, 182, 1158 (1958)
P. G. Shewmon, Diffusion in Solids, p. 28. (McGraw-Hill Book Company, Inc., New York, 1963)
R. L. Longini, Solid-St. Electron., 5, 127 (1962)
J. W. Allen and G. L. Pearson, NASA Cr-438, Stanford University, Stanford, Calif., April 1966
H. C. Casey Jr. and M. B. Panish, Trans. Met. Soc. AIME, 242, 406 (1968)
D. L. Kendall, Semiconductors and Semimetals, Vol. 4, p. 163. Physics of III–V Compounds. (R. K. Willardson and A. C. Beer, eds.). (Academic Press, New York, 1968)
D. W. Yarbrough, Res. and Dev. Tech. Report ECOM-2942, U.S. Army Electronics Command, Fort Monmouth, N.J., March 1968
J. P. Gracey and R. J. Friauf, J. Phys. Chem. Solids, 30, 421 (1969)
C. D. Thurmond, J. Phys. Chem. Solids, 26, 785 (1965)
R. N. Hall, J. Electrochem. Soc. 110, 385 (1963)
W. Köster and B. Thoma, Z. Metall., 46, 291 (1955)
J. R. Arthur, J. Phys. Chem. Solids, 28, 2257 (1967)
D. Richman, J. Phys. Chem. Solids, 24, 1131 (1963)
W. D. Johnston, J. Electrochem. Soc. 110, 117 (1963)
S. F. Nygren, C. M. Ringel and H. W. Verleur, J. Electrochem. Soc. 118, 306 (1971)
M. B. Panish and J. R. Arthur, J. Chem. Thermo., 2, 299 (1970)
N. N. Sirota, Semiconductors and Semimetals, Vol. 4, p. 35. Physics of III–V Compounds (R. K. Willardson and A. C. Beer, eds.). (Academic Press, New York, 1968)
M. B. Panish and H. C. Casey Jr., J. Phys. Chem. Solids, 28, 1673 (1967)
H. R. Potts and G. L. Pearson, J. appl. Phys., 37, 2098 (1966)
F. L. Vook, J. Phys. Soc Japan, 18, Suppl. II, 190 (1963)
G. L. Pearson, H. R. Potts and V. G. Macres, Proc. 7th Inter. Conf. on the Phys. of Semiconductors, Radiation Damage in Semiconductors, p. 197. (Dunod, Cie., Paris, 1965)
R. A. Swalin, J. Phys. Chem. Solids, 18, 290 (1961)
M. E. Straumanis and C. D. Kim, Acta Cryst., 19, 256 (1965)
A. S. Jordan, J. Electrochem. Soc. 118, 781 (1971)
J. Basinski, Can. J. Phys., 44, 941 (1966)
R. J. Sladek, Phys. Rev., 140, A1345 (1965)
F. J. Reid, R. D. Baxter and S. E. Miller, J. Electrochem. Soc. 113, 713 (1966)
Y. J. Van Der Meulen, J. Phys. Chem. Solids, 28, 25 (1967)
B. K. Chakraverty and R. W. Dreyfus, J. appl. Phys., 37, 631 (1966)
D. L. Kendall, Ph.D. Dissertation, Stanford University (1965)
J. A. Harper, unpublished
D. L. Kendall, unpublished
D. L. Kendall and R. A. Huggins, J. appl. Phys., 40, 2750 (1969)
K. Weiser, J. Phys. Chem. Solids, 17, 149 (1960)
R. N. Hall and J. H. Racette, J. appl. Phys., 35, 379 (1964)
J. R. Manning, Diffusion Kinetics for Atoms in Crystals, pp. 95, 166. (D. van Nostrand Co., Princeton, N.J., 1968).
M. B. Panish, J. Electrochem. Soc. 113, 861 (1966)
J. E. Ricci, The Phase Rule and Heterogeneous Equilibrium, p. 1. (D. van Nostrand Co., Princeton, N.J., 1951)
L. L. Chang and G. L. Pearson, J. Phys. Chem. Solids, 25, 23 (1964)
K. K. Shih, J. W. Allen and G. L. Pearson, J. Phys. Chem. Solids, 29, 379 (1968)
H. Fritzsche, J. Phys. Chem. Solids, 6, 69 (1958)
H. Nishimura, Phys. Rev., 138, A815 (1965)
E. A. Davis and W. D. Compton, Phys. Rev., 140, A2183 (1965)
T. N. Morgan, Phys. Rev., 139, A343 (1965)
B. I. Halperin and M. Lax, Phys. Rev., 148, 722 (1966)
N. F. Mott, Phil. Mag., 6, 287 (1961)
N. F. Mott and W. D. Twose, Advan. Phys., 10, 107 (1961)
K. G. Hambleton, C. Hilsum and B. R. Holeman, Proc Phys. Soc. (London), 77, 1147(1961)
Q. H. F. Vrehen, J. Phys. Chem. Solids, 29, 129 (1968)
F. Ermanis and K. B. Wolfstirn, J. appl. Phys., 37, 1963 (1966)
J. Basinski and R. Olivier, Can. J. Phys., 45, 119 (1967)
K. K. Shih, J. W. Allen and G. L. Pearson, J. Phys. Chem. Solids, 29, 367 (1968)
A. S. Jordan, Metal. Trans., 2, 1965 (1971)
H. C. Casey Jr., M. B. Panish and L. L. Chang, Phys. Rev., 162, 660 (1967)
J. R. Brews and C. J. Hwang, J. Chem. Phys., 54, 3263 (1971)
C. J. Hwang and J. R. Brews, J. Phys. Chem. Solids, 32, 837 (1971)
A. J. Rosenberg, J. Chem. Phys., 33, 665 (1960)
D. L. Kendall and M. E. Jones, AIEE-IRE Device Research Conference, Stanford (1961)
J. W. Allen, J. Phys. Chem. Solids, 15, 134 (1960)
B. Goldstein, Phys. Rev., 118, 1024 (1960)
L. R. Weisberg and J. Blanc, Phys. Rev., 131, 1548 (1963)
Reference 14, pp. 23, 122, and 140
K. Weiser, J. appl. Phys., 34, 3387 (1963)
D. Shaw and A. L. J. Wells, Brit. J. appl. Phys., 17, 999 (1966)
C. Van Opdorp, J. appl. Phys., 38, 5411 (1967)
L. L. Chang and G. L. Pearson, J. appl. Phys., 35, 374 (1964)
L. L. Chang and G. L. Pearson, J. appl. Phys., 35, 1960 (1964)
D. Shaw and S. R. Showan, Phys. Stat. Sol., 32, 109 (1969)
C. H. Ting and G. L. Pearson, J. appl. Phys., 42, 2247 (1971)
S. Prussin, J. appl. Phys., 32, 1876 (1961)
G. H. Schwuttke and H. J. Queisser, J. appl. Phys., 33, 1540 (1962)
J. F. Black and E. D. Jungbluth, J. Electrochem. Soc. 114, 181 (1967)
J. F. Black and E. D. Jungbluth, J. Electrochem. Soc. 114, 188 (1967)
M. Maruyama, J. appl. Phys. Japan, 7, 476 (1968)
C. H. Ting and G. L. Pearson, J. Electrochem. Soc. 18, 1454 (1971)
S. F. Nygren and G. L. Pearson, J. Electrochem. Soc. 116, 648 (1969)
J. Black and P. Lublin, J. appl. Phys., 35, 2462 (1964)
R. W. Janes, The Optical Principles of the Diffraction of X-rays, pp. 306–316. (Cornell Univ. Press, Ithaca, N.Y., 1965)
B. G. Cohen, private communication
H. Rupprecht and C. Z. Lemay, J. appl. Phys., 35, 1970 (1964)
M. B. Panish, J. Electrochem. Soc. 113, 224 (1966)
L. L. Chang and H. C. Casey Jr., Solid-St. Electron., 7, 481 (1964)
M. G. Buehler and G. L. Pearson, unpublished
S. R. Showan and D. Shaw. Pibys. Stat. sol. 32, 97 (1969)
C. J. Nuese, G. E. Stillman, M. D. Sirkis and N. Holonyak Jr., Solid-St. Electron., 9, 735(1966)
K. A. Arseni, B. I. Boltaks and T. D. Dzhafarov, Phys. Stat. sol. 35, 1053 (1969)
T. H. Yen, J. Electrochem. Soc. 111, 253 (1964)
A. B. Y. Young and G. L. Pearson, J. Phys. Chem. Solids, 31, 517 (1970)
H. C. Casey Jr., M. B. Panish and K. B. Wolfstirn, J. Phys. Chem. Solids, 32, 571 (1971)
K. H. Zschauer and A. Vogel, ‘GaAs: 1970 Symp. Proc.’, p. 100. (Inst, of Phys., London, 1971)
G. Schottky, J. Phys. Chem. Solids, 27, 1721 (1966)
J. S. Blakemore, Semiconductor Statistics, p. 77. (Pergamon Press, New York, 1962)
M. G. Mil’vidskii and O. V. Pelevin, Inorg. Mater., 3, 1024 (1967);
M. G. Mil’vidskii and O. V. Pelevin translated from Izv. Akad. Nauk. SSSR, Neorg. Mater., 3, 1159 (1967)
L. J. Vieland and I. Kudman, J. Phys. Chem. Solids, 24, 437 (1963)
F. E. Rosztoczy, F. Ermanis, I. Hayashi and B. Schwartz, J. appl Phys., 41, 264(1970)
J. R. West, Indust. and Eng. Chem., 42, 713 (1950)
J. R. Arthur, private communication
S. Antkiw and V. H. Dibeler, J. Chem. Phys., 21, 1890 (1953)
B. Goldstein, Phys. Rev., 121, 1305 (1961)
Reference 18, p. 199
L. J. Vieland, J. Phys. Chem. Solids, 21, 318 (1961)
R. G. Frieser, J. Electrochem. Soc. 112, 697 (1965)
R. A. Burmeister, Jr., private communication
R. J. Archer and D. Kerps, GaAs: 1966 Symp. Proc, p. 103. (Inst, of Phys. and Phys. Soc., London, 1967)
M. Pilkuhn and H. Rupprecht, J. appl Phys., 36, 684 (1965)
A. H. Herzog, W. O. Groves and M. G. Craford, J. appl Phys., 40, 1830 (1969)
M. H. Pilkuhn and H. Rupprecht, Trans. Met. Soc AIME, 230, 296 (1964)
S. R. Shortes, J. A. Kanz and E. C. Wurst Jr., Trans. Met. Soc. AIME, 230, 300 (1964)
H. Becke, D. Flatley, W. Kern and D. Stolnitz, Trans. Met. Soc. AIME, 230, 307 (1964)
Reference 103, p. 96
M. B. Panish and H. C. Casey Jr., J. appl. Phys., 40, 163 (1969)
E. F. Steigmeier, Appl. Phys. Lett., 3, 6 (1963)
Y. P. Varshni, physica, 34, 149 (1967)
G. D. Pitt and J. Lees, Solid-State Comm., 8, 491 (1970)
L. W. Aukerman and R. K. Willardson, J. appl. Phys., 31, 939 (1960)
H. Ehrenreich, Phys. Rev., 120, 1951 (1960)
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1973 Plenum Publishing Company Ltd
About this chapter
Cite this chapter
Casey, H.C. (1973). Diffusion in the III–V Compound Semiconductors. In: Shaw, D. (eds) Atomic Diffusion in Semiconductors. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-8636-4_6
Download citation
DOI: https://doi.org/10.1007/978-1-4615-8636-4_6
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4615-8638-8
Online ISBN: 978-1-4615-8636-4
eBook Packages: Springer Book Archive