Abstract
Thin films of elemental semiconductors such as Si, and of passive dielectrics, such as SiO2 and Si3N4, have already found widespread applications in solid state component technology and in high- density microelectronics. As preparative techniques develop, films of more complex semiconducting and insulating materials are receiving increased study and are gradually being incorporated in a variety of novel devices, both passive-and active. Many of these devices cannot yet be considered as part of the standard range of microelectronic components, and in fact their hybrid organization, and final structural form and function are still the subject of speculation and experimental development. The numerous innovations occuring in thin film devices are amply illustrated by recent work in fields such as microwave diodes and transistors, thin film transistors, infrared detectors, magnetic bubble memories, photovoltaic solar cells, microwave acoustics, capacitors and solid state imaging and display systems.
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Francombe, M.H. (1976). Some Applications of Non-Metallic Thin Films. In: Dupuy, C.H.S., Cachard, A. (eds) Physics of Nonmetallic Thin Films. NATO Advanced Study Institutes Series, vol 14. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-0847-8_17
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DOI: https://doi.org/10.1007/978-1-4684-0847-8_17
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