Abstract
In this chapter, we describe the early development of gallium oxide transistors that led to the most common gallium oxide device: n-type, depletion-mode, metal insulator semiconductor field effect transistor . We relate the enticing material properties of gallium oxide described in earlier chapters to the requirements in design and fabrication of marketable devices for low-loss power switching and radio frequency applications. A route for device optimization is shown by maximizing electric field in the drift region while reducing parasitic resistance. We analyze the developments that will be required to overcome device-related technical barriers such as achieving low contact resistance, reducing effects of self-heating, and increasing device gain. The chapter concludes with recent research and goals for gallium oxide transistors moving forward with subsequent chapters detailing these topics.
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Moser, N., Green, A., Chabak, K., Heller, E., Jessen, G. (2020). Field-Effect Transistors 1. In: Higashiwaki, M., Fujita, S. (eds) Gallium Oxide. Springer Series in Materials Science, vol 293. Springer, Cham. https://doi.org/10.1007/978-3-030-37153-1_31
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