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Laser-Induced Chemical Vapour Deposition of Thin Films in Microelectronics

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Micro System Technologies 90

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Summary

Lateral thin film structures of Si, Mo, W, Co and TiSi2 can be generated by laser-induced pyrolytical and/or photolytical chemical vapour deposition techniques (LCVD) using perpendicular incident focused laser light. The process, and film parameters, e. g. growth rate, film width, crystalline structure, and specific resistance have been investigated and compared with a mathematical model.

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References

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Author information

Authors and Affiliations

  1. University of Engineering Mittweida, Platz der DSF 17, Mittweida, 9250, GDR

    G. Reisse, F. Gänsicke, A. Fischer, K. Zimmer & G. Zscherpe

Authors
  1. G. Reisse
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  2. F. Gänsicke
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  3. A. Fischer
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  4. K. Zimmer
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  5. G. Zscherpe
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Editor information

Editors and Affiliations

  1. Forschungsschwerpunkt Technologie der Mikroperipherik, Technische Universität Berlin, Einsteinufer 17, 1000, Berlin 10, Germany

    Herbert Reichl

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© 1990 Springer-Verlag Berlin Heidelberg

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Reisse, G., Gänsicke, F., Fischer, A., Zimmer, K., Zscherpe, G. (1990). Laser-Induced Chemical Vapour Deposition of Thin Films in Microelectronics. In: Reichl, H. (eds) Micro System Technologies 90. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-45678-7_50

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  • DOI: https://doi.org/10.1007/978-3-642-45678-7_50

  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-45680-0

  • Online ISBN: 978-3-642-45678-7

  • eBook Packages: Springer Book Archive

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