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Thin Film and Depth Profile Analysis

  • Book
  • © 1984

Overview

Editors:
  1. Hans Oechsner

    1. Universität Kaiserslautern, Kaiserslautern, Fed. Rep. of Germany

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Part of the book series: Topics in Current Physics (TCPHY, volume 37)

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Table of contents (8 chapters)

  1. Front Matter

    Pages I-XI
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  2. Introduction

    • H. Oechsner
    Pages 1-4

  3. The Application of Beam and Diffraction Techniques to Thin Film and Surface Micro-Analysis

    • H. W. Werner
    Pages 5-38

  4. Depth Profile and Interface Analysis of Thin Films by AES and XPS

    • H. J. Mathieu
    Pages 39-61

  5. Secondary Neutral Mass Spectrometry (SNMS) and Its Application to Depth Profile and Interface Analysis

    • H. Oechsner
    Pages 63-85

  6. In-Situ Laser Measurements of Sputter Rates During SIMS/AES In-Depth Profiling

    • J. E. Kempf, H. H. Wagner
    Pages 87-102

  7. Physical Limitations to Sputter Profiling at Interfaces — Model Experiments with Ge/Si Using KARMA

    • J. Kirschner, H.-W. Etzkorn
    Pages 103-139

  8. Depth Resolution and Quantitative Evaluation of AES Sputtering Profiles

    • S. Hofmann, J. M. Sanz
    Pages 141-158

  9. The Theory of Recoil Mixing in Solids

    • U. Littmark, W. O. Hofer
    Pages 159-200

  10. Back Matter

    Pages 201-208
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Keywords

About this book

The characterization of thin films and solid interfaces as well as the determina­ tion of concentration profiles in thin solid layers is one of the fields which re­ quire a rapid transfer of the results from basic research to technological applica­ tions and developments. It is the merit of the Dr. Wilhelm Heinrich and Else Heraeus-Stiftung to promote such a transfer by organizing high standard seminars mostly held at the "Physikzentrum" in Bad Honnef near Bonn. The present book has been stimulated by one of these seminars assembling most of the invited speakers as co-authors. The editor appreciates the cooperation of his colleagues contributing to this book. H. Oechsner Kaiserslautern, April 1984 v Contents 1. Introduction. ByH. Oechsner . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1. 1 Requirements for Thin Film and In-Depth Analysis . . . . . . . . . . . . . . . . . . . 1 1. 2 Object and Outl i ne of the Book . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 2 4 References 2. The Application of Beam and Diffraction Techniques to Thin Film and Surface Micro-Analysis. By H. W. Werner (With 25 Fi gures) . . . . . . . . . . . . . . . . 5 2. 1 Methods to Determine Chemical Structures in Material Research 5 2. 2 Selected Analytical Features Used to Determine Chemical Structures 9 2. 2. 1 Depth Profi 1 ing . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9 9 a) Destructive Depth Profiling b) Nondestructive Methods for Depth and Thin Film Analysis 15 19 2. 2. 2 Microspot Analysis and Element Imaging 2. 3 Determining Physical Structures in Material Research . . . . . . . . . . . . . . . 27 2. 3. 1 X-Ray Diffraction . . . . . . . . . . . . . . . . . . . . . . . . . .. . . . . . . . . . . . . . . . . 27 2. 3. 2 X-Ray Double Crystal Diffraction . . . . . . . . . . . . . . . . . . . . . . . . . . . . 28 2. 3.

Editors and Affiliations

  • Universität Kaiserslautern, Kaiserslautern, Fed. Rep. of Germany

    Hans Oechsner

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