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Helium Ion Lithography

Principles and Performance

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Nanofabrication

Abstract

Recent developments show that Scanning Helium Ion Beam Lithography (SHIBL) with a sub-nanometer beam diameter is a promising alternative fabrication technique for high-resolution nanostructures at high pattern densities. Key principles and critical conditions of the technique are explained. From existing data, the fundamental factors underlying the sensitivity gain by 1–2 orders of magnitude and the prospects for high resolution at high pattern densities are analysed. State-of-the-art performance of the technique is illustrated with experimental achievements in HSQ and PMMA resists. Exploratory SHIBL work on aluminum oxide resist is presented as a novel approach to overcome potential shot noise effects in pattern definition and to improve masking capabilities in subsequent pattern transfer.

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Notes

  1. 1.

    More extensive results compared to [6, 14], submitted for publication.

  2. 2.

    Enhancement in previous work [6] was based on erroneous ion current measurement.

  3. 3.

    Submitted for publication.

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Acknowledgements

This research is part of NanoNed, a national research program on nanotechnology, funded by the Dutch Ministry of Economic Affairs of the Netherlands. Our colleagues Ing A.K. van Langen-Suurling, Dr. V. A. Sidorkin, Dr. P.F.A. Alkemade, Prof. H.W.M. Salemink from TU Delft and Dr. E. van Veldhoven from TNO are gratefully acknowledged for their experimental contributions and discussions. The authors acknowledge Prof. D. Joy, Dr. L. Scipioni, Dr. S. Sijbrandij, Dr. Postek, Dr. Livengood, Dr. Vyvenko and Dr. D. Winston for giving permission to use certain figures and data, as indicated in the text.

Author information

Authors and Affiliations

  1. Kavli NanoLab, Delft University of Technology, Delft, The Netherlands

    Emile van der Drift

  2. TNO Science & Industry, Delft, The Netherlands

    Diederik J. Maas

Authors
  1. Emile van der Drift
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  2. Diederik J. Maas
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Correspondence to Emile van der Drift .

Editor information

Editors and Affiliations

  1. , National Research Council of Canada, National Institute for Nanotechnology, Saskatchewan Drive 1142, Edmonton, T6G 2M9, Alberta, Canada

    Maria Stepanova

  2. , Electrical and Computer Engineering, University of Alberta, Edmonton, T6G 2V4, Alberta, Canada

    Steven Dew

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van der Drift, E., Maas, D.J. (2012). Helium Ion Lithography. In: Stepanova, M., Dew, S. (eds) Nanofabrication. Springer, Vienna. https://doi.org/10.1007/978-3-7091-0424-8_4

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