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Bonding mechanism between alumina and niobium

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Abstract

Diffusion couples of Al2O3 single-crystal, sapphire, and Nb polycrystal were heat-treated in the temperature range 1873 to 2073 K under pressure in the range 3 to 15.2 MN m−2 for various times up to 3.6×103 sec. Tensile testing at various temperatures up to 1873 K in a vacuum of about 10−3 Pa, Knoop hardness testing at room temperature, optical microscopy, scanning electron microscopy, transmission electron microscopy, and electron-probe X-ray microanalysis studies were carried out on the specimens. From the results, it was concluded that the fairly high bond strength of a Al2O3-Nb interface might be attributed to the formation of a thin NbO x layer, which had grown epitaxially on the Al2O3 surface. Lattice matching between Al2O3 and NbO x phases was also considered.

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Morozumi, S., Kikuchi, M. & Nishino, T. Bonding mechanism between alumina and niobium. J Mater Sci 16, 2137–2144 (1981). https://doi.org/10.1007/BF00542374

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