Skip to main content
SpringerLink
Log in

Electrical properties of Bi80Sb20 alloy thin films, vacuum-deposited at different substrate temperatures

  • Contents
  • Published:
Journal of Materials Science Aims and scope Submit manuscript

Abstract

Bismuth antimonide (composition 80∶20) alloy thin films have been prepared by vacuum deposition at different substrate temperatures and, after annealing, their resistances have been recorded as a function of temperature, between 77 K and 500 K. The observed resistance against temperature behaviour of the films, and the effect of thickness and substrate temperature during deposition of the films, has been explained by considering that these films behave as semiconductors; the overlap between valence and conduction bands being removed due to the presence of antimony, the influence of a quantum size effect and the fact that the grain size of the films formed is a function of thickness and substrate temperature.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. W. B. Pearson, “Handbook of Lattice Spacings and Structures of Metals and Alloys” Vol. 2 (Pergamon Press, Oxford and New York, 1967) p. 719.

    Google Scholar 

  2. A. L. Jain,Phys. Rev. 114 (1959) 1518.

    Google Scholar 

  3. L. Esaki,J. Phys. Soc. Japan 21 (1966) Suppl. 89.

    Google Scholar 

  4. V. B. Sandomirskii,Sov. Phys. JETP 25 (1967) 101.

    Google Scholar 

  5. K. A. Ramazanov,Sov. Phys. Sol. Stat. 3 (1962) 1640.

    Google Scholar 

  6. H. J. Goldsmid,Phys. Status Solidi (a) 1 (1970) 7.

    Google Scholar 

  7. J. L. Petit andC. R. Bebol,Scand. Acad. Sci. B272 (1971) 211.

    Google Scholar 

  8. R. K. Kar,Nucl. Phys. Sol. Stat. Phys. (India) 14C (1972) 140.

    Google Scholar 

  9. V. Damodara Das andM. S. Jagadeesh,J. Vac. Sci Technol. 19 (1981) 89.

    Google Scholar 

  10. M. S. Jagadeesh, PhD thesis, Indian Institute of Technology, India, 1977.

    Google Scholar 

  11. L. I. Maissel, in “Handbook of Thin Film Technology” edited by L. I. Maissei and R. Glang (McGraw-Hill Book Co., New York, 1970) pp. 13–30.

    Google Scholar 

  12. V. Damodara Das andM. S. Jagadeesh,Thin Solid Films 24 (1914) 203.

    Google Scholar 

  13. Idem, J. Phys. Chem. Solids 38 (1977) 167.

    Google Scholar 

  14. C. A. Neugebauer, in “Physics of Thin Films” Vol. 2, edited by G. Hass and R. Thun (Academic Press, New York, 1964) p. 1.

    Google Scholar 

  15. K. L. Chopra, “Thin Film Phenomena” (McGraw-Hill Book Co., New York, 1969) p. 183.

    Google Scholar 

  16. V. N. Lutski andT. N. Pinsker,Thin Solid Films 66 (1980) 55.

    Google Scholar 

  17. Yu. F. Ogrin, V. N. Lutski andM. I. Elinson,Sov. Phys. JETP Lett. 6 (1967) 58.

    Google Scholar 

  18. V. Damodara Das andN. Jayaprakash,Vacuum 31 (1981) 133.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Thin Film Laboratory, Department of Physics, Indian Institute of Technology, 600 036, Madras, India

    V. Damodara Das & N. Meena

Authors
  1. V. Damodara Das
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. N. Meena
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Damodara Das, V., Meena, N. Electrical properties of Bi80Sb20 alloy thin films, vacuum-deposited at different substrate temperatures. J Mater Sci 16, 3489–3495 (1981). https://doi.org/10.1007/BF00586312

Download citation

  • Received:

  • Accepted:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF00586312

Keywords

Search

Navigation