Abstract
Investigations have been carried out on the kinetics of thin film formation of copper and its alloys in the temperature range of 75–100°C. The experimental results have been found to follow the logarithmic rate law except for the copper-chromium system at 100°C. The kinetic data have been analyzed in light of William and Hayfield's theory, and the various parameters of the logarithmic rate equation match very well to those calculated by others. The estimated activation energy value did not show significant variation. The major contribution to the rate of film growth has been ascribed to the available number of Fermi electrons.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
A. Ronnquist and H. Fischmeister;J. Inst. Met. 89, 65 (1960).
H. A. Miley and U. R. Evans,Nature (London) 139, 283 (1937).
A. B. Winterbottom,Nature (London) 140, 364 (1937).
J. A. Allen,Trans. Faraday Soc. 48, 273 (1952).
T. N. Rhodin,J. Am. Chem. Soc. 72, 5102 (1950).
T. N. Rhodin,J. Am. Chem. Soc. 73, 3143 (1951).
F. W. Young, J. V. Cathcart, and A. T. Gwathmey,Acta Metall. 4, 145 (1956).
P. K. Krishnamoorthy and S. C. Sircar,Acta Metall. 16, 1461 (1968).
P. K. Krishnamoorthy and S. C. Sircar,Oxid Met. 2, 349 (1970).
P. K. Krishnamoorthy and S. C. Sircar,Corrosion (Houston) 24, 407 (1968).
P. K. Krishnamoorthy and S. C. Sircar,J. Electrochem Soc. 116, 734 (1969).
N. F. Mott and N. Cabrera,Rep. Progr. Phys. 12, 163 (1948–49).
N. F. Mott and F. P. Fehlner in,Oxidation of Metals and Alloys (American Society for Metals, Metals Park, Ohio, 1970) p. 37.
K. Hauffe,Oxidation of Metals (Plenum Press, New York, 1965).
W. Cambell and U. Thomas,Trans. Electrochem. Soc. 91, 623 (1947).
R. F. Tylecote,J. Inst. Met. 78, 259 (1950–1951).
I. M. Ritchie,Surf. Sci. 23, 443 (1970).
H. H. Uhlig,Acta Metall. 4, 541 (1956).
E. C. William and P. C. S. Hayfield,Vacancies and Other Point Defects in Metals and Alloys (Institute of Metals Monographs, No. 23, 1957) p. 131.
C. Wagner,Atom Movements, Diffusion and High Temperature Oxidation of Metals, (American Society for Metals, Cleveland, 1952) p. 153.
E. A. Gulbransen, Diffusion in solids, inLiquids and Gases W. Jost, eds. (Academic Press, New York, 1952) p. 394.
H. H. Uhlig, J. Pickett, and J. McNairn,Acta Metall. 7, 111 (1959).
S. K. Roy and S. C. Sircar,Br. Corros. J. 13, 191 (1978).
S. K. Roy, P. K. Krishnamoorthy, and S. C. Sircar,Acta Metall 18, 519 (1970).
S. K. Roy, Kinetics of oxidation of copper and its alloys at low and intermediate temperatures, (Ph.D. Thesis, Indian Institute of Technology, Kharagpur, India, 1976).
N. F. Mott and R. W. Gurney,Electronic Processes in Ionic Crystals, 2nd ed. (Oxford University Press, New York, 1948).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Roy, S.K., Sircar, S.C. A critical appraisal of the logarithmic rate law in thin-film formation during oxidation of copper and its alloys. Oxid Met 15, 9–20 (1981). https://doi.org/10.1007/BF00603754
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF00603754