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Electron-electron interaction and weak localization

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Abstract

A consistent description of the effects of inelastic electron-electron scattering processes on weak localization in thin metal films is presented. Different techniques are used to treat strongly inelastic processes and quasielastic collisions, with special attention to the treatment of the latter. The calculations give an upper bound for the decay rate of the particle-particle propagator. This rate is proportional to the temperature and depends rather strongly on the conductance of the film. The calculation of the magnetoconductance connects this rate with measurable quantities and also reveals a dependence on the magnetic field. Finally, a description that avoids the splitting into two energy regions is presented.

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Authors and Affiliations

  1. Institut für Theorie der Kondensierten Materie, Universität Karlsruhe, Karlsruhe, West Germany

    Walter Eiler

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  1. Walter Eiler
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Eiler, W. Electron-electron interaction and weak localization. J Low Temp Phys 56, 481–498 (1984). https://doi.org/10.1007/BF00681807

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  • DOI: https://doi.org/10.1007/BF00681807

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