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Formation, structural and optical properties of tellurium oxide films deposited by a plasma process (PARBAD)

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Abstract

Tellurium oxide films have been formed by reactively evaporating tellurium in an r.f. discharge plasma of oxygen. Bias variation has been found to reveal interesting structural changes and different optical properties for the films formed. Qualitative observations regarding the physical and chemical reactions at the substrate have been reported.

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Authors and Affiliations

  1. Department of Physics, Bharathiar University, 641 046, Coimbatore, India

    N. Lakshminarayan, M. Radhakrishnan & C. Balasubramanian

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  1. N. Lakshminarayan
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  2. M. Radhakrishnan
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  3. C. Balasubramanian
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Lakshminarayan, N., Radhakrishnan, M. & Balasubramanian, C. Formation, structural and optical properties of tellurium oxide films deposited by a plasma process (PARBAD). J Mater Sci 19, 2368–2372 (1984). https://doi.org/10.1007/BF01058113

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  • DOI: https://doi.org/10.1007/BF01058113

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