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A survey of ion implantation techniques for enhanced property modification for tailored materials

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Abstract

The paper describes the various methods that have been developed for property modification of materials. Methods include ion implantation, sputtering and combination processes. Applications are listed with particular reference to semi-conductors.

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References

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Authors and Affiliations

  1. Department of Mechanical Engineering, Osmania University College of Engineering, Hyderabad, India

    T. A. Rao

  2. Defence Research and Development Laboratory, Hyderabad, India

    T. V. Karthikeyan

Authors
  1. T. A. Rao
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  2. T. V. Karthikeyan
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Rao, T.A., Karthikeyan, T.V. A survey of ion implantation techniques for enhanced property modification for tailored materials. Int J Adv Manuf Technol 14, 153–159 (1998). https://doi.org/10.1007/BF01188410

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  • DOI: https://doi.org/10.1007/BF01188410

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