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Metallic clusters surface interaction: The case of Pd/SiOx/n-Si(100)

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Zeitschrift für Physik D Atoms, Molecules and Clusters

Abstract

Atomic Force Microscopy (A.F.M.) and Rutherford back scattering (R.B.S.) have been employed to study the nucleation and growth phenomena of Palladium clusters cattered onto a thin (20 Å) layer of SiOx, grown by plasma oxidation onto Si(100) doped B surface. X ray photoemission (XPS) of the 3d core level of palladium has permitted to follow the clusters silica interaction. Intrinsic final state size effect and extrinsic initial chemical state are discussed for clusters in the range of 10 to 104 atoms.

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Authors and Affiliations

  1. Laboratoire de Physico-Chimie des Surfaces, C.N.R.S. ura 425 - E.N.S.C.P. 11, rue Pierre et Marie Curie, 75231, Paris cedex 05

    B. Bellamy, S. Mechken & A. Masson

Authors
  1. B. Bellamy
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  2. S. Mechken
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  3. A. Masson
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Bellamy, B., Mechken, S. & Masson, A. Metallic clusters surface interaction: The case of Pd/SiOx/n-Si(100). Z Phys D - Atoms, Molecules and Clusters 26 (Suppl 1), 61–63 (1993). https://doi.org/10.1007/BF01425618

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  • DOI: https://doi.org/10.1007/BF01425618

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