Abstract
Using the molecular beam epitaxial (MBE) technique, CdTe and Hg1-xCdxTe have been grown on Cr-doped GaAs (100) sub-strates. A single effusion cell charged with polycrystal-line CdTe is used for the growth of CdTe films. The CdTe films grown at 200 °C with a growth rate of ~ 2 μm/hr show both streaked and “Kikuchi” patterns, indicating single crystalline CdTe films are smoothly grown on the GaAs sub-strates. A sharp emission peak is observed at near band-edge (7865 Å, 1.577 eV) in the photoluminescence spectrum at 77 K. For the growth of Hg1-xCdxTe films, separate sources of HgTe, Cd and Te are used. Hg0.6Cd0.4Te films are grown at 50 °C with a growth rate of 1.7 μm/hr. The surfaces are mirror-smooth and the interfaces between the films and the substrates are very flat and smooth. As-grown Hg0.6Cd0.4Te films are p-type and converted into n-type by annealing in Hg pressure. Carrier concentration and Hall mobility of an annealed Hg0.6Cd0.4Te film are 1 × 1017 cm−3 and 1000 cm2/V-sec at 77 K, respectively.
Similar content being viewed by others
References
J.T. Longo, D.T. Cheung, A.M. Andrews, C.C Wang, and J.M. Tracy, IEEE Trans. Electron DevicesED-25, 213 (1978).
P. Felix, M. Moulin, B. Munier, J. portmann, and J-P. Reboul, IEEE Trans. Electron DevicesED-27, 175 (1980).
R.D. Thom, T.L. Koch, J.D. Langan, and W.J. Parrish, IEEE Trans. Electron DevicesED-27, 160 (1980).
B.E. Bartlett, P. Capper, J.E. Harris, and M.J.T. Quelch, J. Crystal Growth 46, 623(1979).
M. Itoh, H. Takigawa, and R. Ueda, IEEE Trans. Electron DevicesED-27, 150 (1980).
T.C. Harman, J. Electron. Mater.9, 945(1980).
J.L. Schrait and J.E. Bowers, Appl. Phys. Lett.35, 457 (1979).
M. Chu and C.C. Wang, J. Appl. Phys.51, 2255 (1980).
J.A. Mroczkowski and H.R. Vydyanath, J. Electrochem. Soc.128, 655 (1981).
J.L. Schmit, R.J. Hager, and R.A. Wood, J. Crystal Growth56, 485 (1982).
D.L. Smith and V.Y. Pickhardt, J. Appl. Phys.46, 2366 (1975).
J.P. Faurie and A. Million, J. Crystal Growth54, 577 (1981).
R.F.C. Farrow, G.R. Jones, G.M. Williams, and I.M. Young, Appl. Phys. Lett.39, 954 (1981).
J.P. Faurie and A. Million, J. Crystal Growth54, 582 (1981).
M. Chu, J. Appl. Phys.51, 5876 (1980).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Nishitani, K., Ohkata, R. & Murotani, T. Molecular beam epitaxy of CdTe and Hg1-xCdxTe ON GaAs (100). J. Electron. Mater. 12, 619–635 (1983). https://doi.org/10.1007/BF02650868
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF02650868