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Kinetics of layer growth and multiphase diffusion in ion- nitrided titanium

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Abstract

Pure titanium specimens were ion nitrided in a nitrogen plasma in the temperature range of 800 ‡C to 1080 ‡C at various nitrogen partial pressures. During ion nitriding, titanium nitrides TiN and Tiin2N and nitrogen solid solution layers (α and Β) were formed consistent with the equilibrium phase diagram. The kinetics of growth of these layers were studied as a function temperature and ion-nitriding parameters. An analytical diffusion model for multiphase diffusion was used to calculate the diffusion coefficients of nitrogen in the phases of the Ti-TiN system from layer growth experiments. Using the layer growth data, the temperature dependence of nitrogen diffusion in TiN (δ), Ti2N (ε), and α titanium was found to obey the following relations: Dinδ=4.4±1.62 × 10su-5 exp-36,500±1400/RT Dinε=2.7±1.05 ×10su-3 exp-35,760±2500/RT Dinα=0.96±0.08 × exp-51,280-505/RT

Concentration profiles of nitrogen were measured in specimens ion nitrided at 900 ‡C. The profiles were in good agreement with the predicted ones at high nitrogen concentrations. How-ever, at low nitrogen concentrations, a deviation was observed, assumed to be due to a con-centration dependence of nitrogen diffusion in a titanium.

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Authors and Affiliations

  1. Material and Metallurgical Engineering Department, New Mexico Institute of Mining and Technology, 87801, Socorro, NM

    Erol Metin & Osman T. Inal (Professor and Chairman)

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  1. Erol Metin
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  2. Osman T. Inal
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Formerly Graduate Student, New Mexico Institute of Mining and Technology

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Metin, E., Inal, O.T. Kinetics of layer growth and multiphase diffusion in ion- nitrided titanium. Metall Trans A 20, 1819–1832 (1989). https://doi.org/10.1007/BF02663213

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