Abstract
In the present paper, the effect of in-situ substrate nitridation time on crystalline quality of GaN films grown on Si (111) substrates by metal organic chemical vapor deposition (MOCVD) were investigated. A thin buffer layer of silicon nitride (SiN x ) with various thicknesses was achieved through the nitridation of substrate at different nitiridation times ranging from 0 to 660 s. The structural characteristics, such as dislocation densities, correlation lengths of columnar crystallites, the tilt and twist of the mosaic structure, and the angles of rotational disorder, were all studied in detail by using a planar and cross-sectional view of high resolution transmission electron microscopy (HRTEM) and X-ray diffraction (HRXRD) performed at different scattering geometries. It was found that the dislocation densities, lateral coherence lengths, vertical coherence lengths, and the tilt and twist of mosaic blocks in GaN films monotonically varies with the nitridation time. The experimental findings showed that the nitridation times had more influence on edge dislocation densities than the screw type.
Similar content being viewed by others
References
S.N. Mohammad, A. Salvador, H. Morkoç, Proc. IEEE 83, 1420 (1996)
L. Shen, S. Heikman, B. Moran, R. Coffie, N.-Q. Zhang, D. Buttari, I.P. Smorchkova, S. Keller, S.P. DenBaars, U.K. Mishra, IEEE Electron Device Lett. 22, 457 (2001)
S. Butun, M. Gokkavas, H. Yu, E. Ozbay, Appl. Phys. Lett. 89, 073503 (2006)
T. Tut, M. Gokkavas, B. Butun, S. Butun, E. Ulker, E. Ozbay, Appl. Phys. Lett. 89, 183524 (2006)
H. Yu, D. Caliskan, E. Ozbay, J. Appl. Phys. 100, 033501 (2006)
R. Gaska, J.W. Yang, A. Osinsky, Q. Chen, M. Asif Khan, A.O. Orlov, G.L. Snider, M.S. Shur, Appl. Phys. Lett. 72, 707 (1998)
A. Dadgar, C. Hums, A. Diez, J. Bläsing, A. Krost, J. Cryst. Growth 297, 279 (2006)
S. Pal, C. Jacob, Bull. Mater. Sci. 27, 501 (2004)
A. Krost, A. Dadgar, Mater. Sci. Eng. B 93, 77 (2002)
M.-H. Kim, Y.-G. Do, H.C. Kang, D.Y. Noh, S.-J. Park, Appl. Phys. Lett. 79, 2713 (2001)
Z.L. Fang, S.P. Li, J.C. Li, H.Z. Sun, S.J. Wang, J.Y. Kang, Thin Solid Films 516, 6344 (2008)
K. Cheng, M. Leys, S. Degroote, B. Van Daele, S. Boeykens, J. Derluyn, M. Germain, G. Van Tendeloo, J. Engelen, G. Borghs, J. Electron. Mater. 35, 592 (2006)
S. Raghavan, J.M. Redwing, J. Appl. Phys. 98, 023514 (2005)
J. Huang, Z. Ye, L. Wang, J. Yuan, B. Zhao, H. Lu, Solid-State Electron. 46, 1231 (2002)
W.-Y. Uena, Z.-Y. Li, S.-M. Lan, S.-M. Liao, J. Cryst. Growth 280, 335 (2005)
C.-L. Wu, J.-C. Wang, M.-H. Chan, T.T. Chen, S. Gwo, Appl. Phys. Lett. 83, 4530 (2003)
P.R. Hageman, S. Haffouz, V. Kirilyuk, A. Grzegorczyk, P.K. Larsen, Phys. Stat. Sol. (a) 188, 523 (2001)
T. Metzger, R. Höppler, E. Born, O. Ambacher, M. Stutzmann, R. Stömmer, M. Schuster, H. Göbel, S. Christiansen, M. Albrecht, H.P. Strunk, Philos. Mag. A 77, 1013 (1998)
B. Heying, X.H. Wu, S. Keller, Y. Li, D. Kapolnek, B.P. Keller, S.P. DenBaars, J.S. Speck, Appl. Phys. Lett. 68, 643 (1995)
M.E. Vickers, M.J. Kappers, R. Datta, C. McAleese, T.M. Smeeton, F.D.G. Rayment, C.J. Humphreys, J. Phys. D Appl. Phys. 38, 99 (2005)
N.G. Weimann, L.F. Eastman, J. Appl. Phys. 83, 3656 (1998)
V. Holy, J. Kubena, E. Abramof, K. Lischka, A. Pesek, E. Koppensteiner, J. Appl. Phys. 74, 1736 (1993)
V. Srikant, J.S. Speck, D.R. Clarke, J. Appl. Phys. 82, 4286 (1997)
X.H. Zheng, H. Chen, Z.B. Yan, Y.J. Han, H.B. Yu, D.S. Li, Q. Huang, J.M. Zhou, J. Cryst. Growth 255, 63–67 (2003)
G.K. Williamson, W.H. Hall, Acta Metall. 1, 22 (1953)
Y.J. Sun, O. Brandt, K.H. Ploog, J. Mater. Res. 18, 1247 (2003)
H. Sasaki, S. Kato, T. Matsuda, Y. Sato, M. Iwami, S. Yoshida, J. Cryst. Growth 298, 305 (2007)
P. Gay, P.B. Hirsch, A. Kelly, Acta Metall. 1, 315 (1953)
C.G. Dunn, E.F. Koch, Acta Metall. 5, 548 (1957)
H. Lahreche, P. Vennegues, B. Beaumont, P. Gibart, J. Cryst. Growth 205, 245 (1999)
D.M. Follstaedt, P.P. Provencio, N.A. Missert, C.C. Mitchell, D.D. Koleske, A.A. Allerman, C.I.H. Ashby, Appl. Phys. Lett. 81, 2758 (2002)
R. Datta, M.J. Kappers, J.S. Barnard, C.J. Humphreys, Appl. Phys. Lett. 85, 3411 (2004)
X. Weng, S. Raghavan, J.D. Acord, A. Jain, E.C. Dickey, J.M. Redwing, J. Cryst. Growth 300, 217 (2007)
S. Kaiser, M. Jakob, J. Zweck, W. Gebhardt, O. Ambacher, R. Dimitrov, A.T. Schremer, J.A. Smart, J.R. Shealy, J. Vac. Sci. Technol. B 18(2), 733 (2000)
F. Wu, S. Zamir, B. Meyler, J. Salzman, Y. Golan, J. Electron. Mater. 31, 88 (2002)
Y. Nakada, I. Aksenov, H. Okumura, Appl Phys Lett. 73, 6951 (1998)
L. Dobos, B. Pécz, E. Feltin, B. Beaumont, P. Gibart, Vacuum 71, 285 (2003)
M.-H. Kim, Y.-C. Bang, N.-M. Park, C.-J. Choi, T.-Y. Seong, S.-J. Park, Appl. Phys. Lett. 78, 2858 (2001)
A. Chakraborty, K.C. Kim, F. Wu, J.S. Speck, S.P. DenBaars, U.K. Mishra, Appl. Phys. Lett. 89, 041903 (2006)
M. Tamura, M. López-López, T. Yodo, Superficies Vacío 13, 80 (2001)
Z. Fang, Surf. Coat. Technol. 202, 4198 (2008)
Z.L. Fang, J.Y. Kang, W.J. Huang, H.T. Sun, M. Lu, J.F. Kong, W.Z. Shen, J. Phys. Chem. C 112, 4925 (2008)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Arslan, E., Ozturk, M.K., Duygulu, Ö. et al. The influence of nitridation time on the structural properties of GaN grown on Si (111) substrate. Appl. Phys. A 94, 73–82 (2009). https://doi.org/10.1007/s00339-008-4939-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00339-008-4939-7