Abstract
Uniform InGaN nanodots were successfully grown on SiO2 pretreated GaN surface. It was found that the InGaN nanodots were 20 nm in diameter and 5 nm in height, approximately. After the growth of two periods of InGaN/GaN quantum wells on the surface of InGaN nanodots, nanodot structure still formed in the InGaN well layer caused by the enhanced phase separation phenomenon. Dual-color emissions with different behavior were observed from photoluminescence (PL) spectrum of InGaN nanodots hybrid with InGaN/GaN quantum wells. A significant blueshift and a linewidth broadening were measured for the low-energy peak as the increase of PL excitation power, while a slight blueshift and a linewidth narrowing occurred for the high-energy peak. Accordingly, these two peaks were assigned to be from the In-rich nanodots and quantized state transition from the InGaN/GaN quantum wells with indium content, respectively.
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Acknowledgements
This work is supported by Special Funds for Major State Basic Research Project (2011CB301900), National Nature Science Foundation of China (61176063, 60990311, 60820106003, 60906025, 60936004). The nature science foundation of Jiangsu province (BK2008019, BK2010385, BK2009255, BK2010178, BK2011436), the Research Funds from NJU-Yangzhou Institute of Optoelectronics.
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Yang, G.F., Chen, P., Yu, Z.G. et al. Growth and characterization of InGaN nanodots hybrid with InGaN/GaN quantum wells. Appl. Phys. A 109, 337–341 (2012). https://doi.org/10.1007/s00339-012-7112-2
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DOI: https://doi.org/10.1007/s00339-012-7112-2