Abstract
Arc-discharge synthesized multiwalled carbon nanotubes (AD-MWNT) have been proven to be of high quality, but their use is very limited due to difficulties in obtaining them in a clean and undamaged form. Here, we present a simple method that purifies raw AD-MWNT material in laboratory scale without damage, and that in principle can be scaled up. The method consists of depositing raw AD-MWNT material on a flat substrate and immersing the substrate slowly in water, whereby the surface tension force of the liquid–substrate contact line selectively sweeps away the larger amorphous carbon debris and leaves relatively clean MWNTs on the substrate. We demonstrate the utility of the method by preparing clean individual MWNTs for measurement of their Raman spectra. The spectra exhibit the characteristics of high-quality tubes free from contaminants. We also show how one concomitantly with the purification process can obtain large numbers of clean suspended MWNTs.
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J.H. Lehman, M. Terrones, E. Mansfield, K.E. Hurst, V. Meunier, Carbon 49, 8 (2011)
M. Buitelaar, A. Bachtold, T. Nussbaumer, M. Iqbal, C. Schonenberger, Phys. Rev. Lett. 88, 15 (2002)
D. Mtsuko, A. Koshio, M. Yudasaka, S. Iijima, M. Ahlskog, Phys. Rev. B 91, 19 (2015)
R. Tarkiainen, M. Ahlskog, A. Zyuzin, P. Hakonen, M. Paalanen, Phys. Rev. B 69, 3 (2004)
H. Jackman, P. Krakhmalev, K. Svensson, J. Appl. Phys. Lett. 117, 8 (2015)
J. Cumings, A. Zettl, Phys. Rev. Lett. 93, 8 (2004)
X. Wang, Y. Ouyang, L. Jiao, H. Wang, L. Xie, J. Wu, J. Guo, H. Dai, Nat. Nanotechnol. 6, 9 (2011)
P.X. Hou, C. Liu, H.M. Cheng, Carbon 46, 15 (2008)
M.J. Hokkanen, R. Lehto, J. Takalo, J. Salmela, S. Haavisto, A. Bykov, R. Myllyl, J. Timonen, M. Ahlskog, Colloids Surf. A 482, 624–30 (2015)
B. Bhushan, in Springer Handbook of Nanotechnology, 2nd edn., ed. by B. Bhusnan (Springer, Berlin, 2010), pp. 1387–1388
A.F.M. Leenaars, S.B.G. O’Brien, Philips J. Res. 44, 2–3 (1989)
P. Sharma, M. Flury, J. Zhou, J. Colloid Interface Sci. 326, 1 (2008)
M.C. LeMieux, M. Roberts, S. Barman, Y.W. Jin, J.M. Kim, Z. Bao, Science 321, 5885 (2008)
S. Aramrak, M. Flury, J.B. Harsh, Langmuir 27, 16 (2011)
V. Lazouskaya, L.P. Wang, D. Or, G. Wang, J.L. Caplan, Y. Jin, J. Colloid Interface Sci. 406, 44–50 (2013)
G.W. Gale, R.J. Small, K.A. Reinhardt, in Handbook of Silicon Wafer Cleaning Technolog, 2nd edn., ed. by K.A. Reinhardt, W. Kern (William Andrew Inc., Norwich, 2008), p. 307
P. Yi, K.L. Chen, Environ. Sci. Technol. 47, 21 (2013)
A. Bensimon, A.J. Simon, A. Chiffaudel, V. Croquette, F. Heslot, D. Bensimon, Science 265, 5181 (1994)
S. Gerdes, T. Ondarcuhu, S. Cholet, C. Joachim, Europhys. Lett. 48, 3 (1999)
Y.J. Shin, Y. Wang, H. Huang, G. Kalon, A.T.S. Wee, Z. Shen, C.S. Bhatia, H. Yang, Langmuir 26, 6 (2010)
J. Rafiee, X. Mi, H. Gullapalli, A.V. Thomas, F. Yavari, Y. Shi, P.M. Ajayan, N.A. Koratkar, Nat. Mater. 11, 3 (2012)
J.F. Joanny, P.G. de Gennes, J. Chem. Phys. 81, 1 (1984)
N. Chatterjee, M. Flury, Langmuir 29, 25 (2013)
S. Aramrak, M. Flury, J.B. Harsh, R.L. Zollards, H.P. Davis, Langmuir 29, 19 (2013)
D. Bensimon, A.J. Simon, V. Croquette, A. Bensimon, Phys. Rev. Lett. 74, 23 (1995)
C.Y. Khripin, M. Zheng, A. Jagota, J. Colloid Interface Sci. 330, 2 (2009)
X. Zhao, Y. Ando, L.C. Qin, H. Kataura, Y. Maniwa, R. Saito, Appl. Phys. Lett. 81, 41 (2002)
S. Nanot, M. Millot, B. Raquet, J.M. Broto, A. Margrez, J. Gonzales, Phys. E 42, 9 (2010)
X. Hou, L. Sheng, L. Yu, K. An, Y. Ando, X. Zhao, J. Raman Spectrosc. 43, 10 (2012)
M.S. Dresselhaus, A. Jorio, R. Saito, Annu. Rev. Condens. Matter Phys. 1, 89–108 (2010)
S.N. Bokova, E.D. Obraztsova, V.V. Grebenyukov, K.V. Elumeeva, A.V. Ishchenko, V.L. Kuznetsov, Phys. Status Solidi B 247, 11–12 (2010)
Y. Chen, Y. Zhang, Y. Hu, L. Kang, S. Zhang, H. Xie, D. Liu, Q. Zhao, Q. Li, J. Zhang, Adv. Mater. 26, 34 (2014)
Acknowledgments
M.Sc. Hannu Pasanen is acknowledged for his help with the preliminary experiments, and M.Sc. Roope Lehto and Prof. Jussi Timonen for useful discussions. Dr. Sami Malola is acknowledged for producing the 3D illustration in Fig. 7b. Author Matti J. Hokkanen gratefully acknowledges financial support from the Finnish National Graduate School in Material Physics (NGSMP) and the National Doctoral Programme in Nanoscience (NGS-NANO).
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Hokkanen, M.J., Lautala, S., Shao, D. et al. On-chip purification via liquid immersion of arc-discharge synthesized multiwalled carbon nanotubes. Appl. Phys. A 122, 634 (2016). https://doi.org/10.1007/s00339-016-0154-0
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DOI: https://doi.org/10.1007/s00339-016-0154-0