An approach to layout and process verification for microsystem physical design

Abstract

 The physical phases of microsystem design are concerned with generating all data needed to fabricate microstructures. As lithography-based technologies are used to fabricate MEMS, this includes the design of two-dimensional mask layouts as well as the design of process step sequences and parameters which determine the object extensions in the third dimension. LIDO is a MEMS physical design system that supports this concurrent design strategy by providing tools to easily configure appropriate process sequences, to derive consistent sets of geometric layout design rules from them and to use these design rules to verify mask layouts.