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Characterization of the performance and failure mechanisms of boron-doped ultrananocrystalline diamond electrodes

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Abstract

This research investigated the anodic stability of boron-doped ultrananocrystalline diamond (BD-UNCD) film electrodes on a variety of substrates (Si, Ta, Nb, W, and Ti) at a current density of 1 A cm−2. At an applied charge of 100 A h cm−2, measurable BD-UNCD film wear was not observed using SEM cross-sectional measurements. However, anodic treatment of the electrodes resulted in surface oxidation and film delamination, which caused substantial changes to the electrochemical properties of the electrodes. The substrate roughness, substrate electroactivity, and compactness of the substrate oxide were key parameters that affected film adhesion, and the primary mechanism of electrode failure was delamination of the BD-UNCD film. Substrate materials whose oxides had a larger coefficient of thermal expansion relative to the reduced metal substrates resulted in film delamination. The approximate substrate stability followed the order of: Ta > Si > Nb > W ≫ Ti.

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Acknowledgments

We thank the National Science Foundation Small Business for Innovative Research program (NSF-IIP-0945935) for the financial support of this work. We also thank Craig Duncan and Laura-Ann Chin for conducting TCE oxidation experiments and Dr. Orchideh Azizi for performing EIS fits.

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Authors and Affiliations

  1. Department of Civil and Environmental Engineering, Villanova University, 800 E. Lancaster Ave., Villanova, PA, 19085, USA

    Brian P. Chaplin

  2. Advanced Diamond Technologies Inc., 429 B Weber Road, #286, Romeoville, IL, 60446, USA

    Ian Wyle, Hongjun Zeng & John A. Carlisle

  3. Department of Chemical and Environmental Engineering, University of Arizona, 1133 E. James E. Rogers Way, Tucson, AZ, 85721, USA

    James Farrell

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  1. Brian P. Chaplin
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  2. Ian Wyle
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  3. Hongjun Zeng
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  5. James Farrell
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Correspondence to Brian P. Chaplin.

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Chaplin, B.P., Wyle, I., Zeng, H. et al. Characterization of the performance and failure mechanisms of boron-doped ultrananocrystalline diamond electrodes. J Appl Electrochem 41, 1329–1340 (2011). https://doi.org/10.1007/s10800-011-0351-7

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  • DOI: https://doi.org/10.1007/s10800-011-0351-7

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