Abstract
We have shown that threading dislocations can be removed from patterned heteroepitaxial semiconductors by glide to the sidewalls, which is driven by the presence of image forces. In principle, it should be possible to attain highly mismatched heteroepitaxial semiconductors which are completely free from threading dislocations, even though they are not pseudomorphic, by patterned heteroepitaxial processing. There are two basic approaches to patterned heteroepitaxial processing. The first involves selective area growth on a pre-patterned substrate. The second approach involves post-growth patterning followed by annealing. We have developed a quantitative model which predicts that there is a maximum lateral dimension for complete removal of threading dislocations by patterned heteroepitaxy. According to our model, this maximum lateral dimension is proportional to the layer thickness and increases monotonically with the lattice mismatch. For heteroepitaxial materials with greater than 1% lattice mismatch, our model predicts that practical device-sized threading dislocation-free regions may be realized by patterned heteroepitaxial processing.
Similar content being viewed by others
References
R. Beanland, D.J. Dunstan and P.J. Goodhew, Adv. Phys. 45, 87 (1996).
R. Fischer, N. Chand, W. Kopp, H. Morkoç, L.P. Erickson and R. Youngman, Appl. Phys. Lett. 47, 397 (1985).
K. Maeda, M. Sato, A. Kubo and S. Takeuchi, J. Appl. Phys. 54, 161 (1983).
S. Sakai, T. Soga, M. Takeyasu and M. Umeno, Jpn. J. Appl. Phys. 24, L666 (1985).
T.H. Windhorn and G.M. Metze, Appl. Phys. Lett. 47, 1031 (1985).
J.P. van der Ziel, R.D. Dupuis and J.C. Bean, Appl. Phys. Lett. 48, 1713 (1986).
H. Shiraiski, R. Yamada, N. Matsui and M. Umeno, Jpn. J. Appl. Phys. 26, L198 (1987).
D.W. Nam, N. Holonyak, K.C. Hsieh, R.W. Kaliski, J.W. Lee, H. Shichijo, J.E. Epler, R.D. Burnham and T.L. Paoli, Appl. Phys. Lett. 51, 39 (1987).
R.W. Kaliski, N. Holonyak, K.C. Hsieh, D.W. Nam, J.W. Lee, H. Shichijo, R.D. Burnham, J.E. Epler and H.F. Chung, Appl. Phys. Lett. 50, 836 (1987).
R.D. Dupuis, J.P. van der Ziel, R.A. Logan, J.M. Brown and C.J. Pinzone, Appl. Phys. Lett. 50, 407 (1987).
J.P. van der Ziel, R.D. Dupuis, R.A. Logan, R.M. Mikulyak, C.J. Pinzone and A. Savage, Appl. Phys. Lett. 50, 454 (1987).
M. Razeghi, M. Defour, F. Omnes, Ph. Maurel and J. Chazelas, Appl. Phys. Lett. 53, 725 (1988).
J.P. van der Ziel, R.D. Dupuis, R.A. Logan and C.J. Pinzone, Appl. Phys. Lett. 51, 89 (1987).
S.N.G. Chu and Nakahara, Appl. Phys. Lett. 56, 434 (1990).
E.A. Fitzgerald, P.D. Kirchner, R. Proano, G.D. Pettit, J.M. Woodall and D.G. Ast, Appl. Phys. Lett. 52, 1496 (1988).
E.A. Fitzgerald and N. Chand, J. Electron. Mater. 20, 839 (1991).
J.E. Ayers, dissertation, Rensselaer Polytechnic Institute, Troy, New York, (1990).
J.E. Ayers, U. S. Patent Pending (1997).
N.H. Karam, V. Haven, S.M. Vernon, N. El-Masry, E.H. Lingunis and N. Haegal, J. Cryst. Growth 107, 129 (1991).
A. Ackaert, P. Demeester, L. Buydens, G. Coudenys, P. Van Daele and M. Renaud, J. Cryst. Growth 107, 822 (1991).
N. Chand and S.N.G. Chu, Appl. Phys. Lett. 58, 74 (1991).
P. Sheldon, K.M. Jones, M.M. Al-Jassim and B.G. Yacobi, J. Appl. Phys. 63, 5609 (1988).
M. Tachikawa and M. Yamaguchi, Appl. Phys. Lett. 56, 484 (1990).
J.E. Ayers, S.K. Ghandhi and L.J. Schowalter, Mater. Res. Soc. Symp. Proc. 209, 661 (Pittsburgh, PA: Mater. Res. Soc., 1991).
J.E. Ayers, L.J. Schowalter and S.K. Ghandhi, J. Cryst. Growth 125, 329 (1992).
H. Tatsuoka, H. Kuwubara, Y. Nakanishi and H. Fujiyasu, Thin Solid Films 201, 59 (1991).
K. Durose and H. Tatsuoka, Proc. M.S.M. Conf., Oxford, UK (1993).
J.E. Ayers, J. Appl. Phys. 78, 3726 (1995).
J.S. Speck, M.A. Brewer, G. Beltz, A.E. Romanov and W. Pompe, J. Appl. Phys. 80, 3808 (1996).
A.E. Romanov, W. Pompe, G.E. Beltz and J.S. Speck, Appl. Phys. Lett. 69, 3342 (1996).
V. Natarajan (unpublished) and J.E. Ayers, dissertation, Rensselaer Polytechnic Institute, Troy, NY (1990).
C. Muggelberg, dissertation, Humboldt University, Berlin (1992).
J.W. Matthews, A.E. Blakeslee and S. Mader, Thin Solid Films 33, 253 (1976).
G. H. Olsen, J. Cryst. Growth 31 223 (1975).
E.A. Fitzgerald, Y.-H. Xie, M.L. Green, D. Brasen, A.R. Kortan, J. Michel, Y.-J. Mii and B.E. Weir, Appl. Phys. Lett. 59, 811 (1991).
Y.-H. Xie, E.A. Fitzgerald, P.J. Silverman, A.R. Kortan and B.E. Weir, Mater. Sci. Engr. B 14, 332 (1992).
J.C.C. Fan, B.-Y. Tsaur, P. Gale and F.M. Davis, U.S. Patent 5,091,333 (1992).
M. Sugo, H. Mori, Y. Itoh and Y. Sakai, Ext. Abs. Intl. Conf. on Solid State Devices and Materials, 1992 (unpublished).
T. Yamada, M. Tachikawa, T. Sasaki, H. Mori And Y. Kadota, Appl. Phys. Lett. 70, 1614 (1997).
E.A. Fitzgerald, G.P. Watson, R.E. Proano, D.G. Ast, P.D. Kirchner, G.D. Pettit and J.M. Woodall, J. Appl. Phys. 65, 2220 (1989).
G.P. Watson, E.A. Fitzgerald, Y.-H. Xie, P.J. Silverman, A.E. White and K.T. Short, Appl. Phys. Lett. 63, 746 (1993).
G.P. Watson, M.O. Thompson, D.G. Ast, A. Fischer-Colbrie and J. Miller, J. Electron. Mater. 19, 957 (1990).
D. Hull and D.J. Bacon, Introduction to Dislocations, 3rd. Ed. (New York: Pergamon, 1984).
P. Haasan, Acta Met. 5, 598 (1957).
R. Hull and J.C. Bean, J. Appl. Phys. 66, 5837 (1989).
Y.H. Lo, Appl. Phys. Lett. 59, 2311 (1991).
D. Teng and Y.H. Lo, Appl. Phys. Lett. 62, 1687 (1993).
F.E. Ejeckam, Y.H. Lo, S. Subramanian, H.Q. Hou and B.E. Hammons, Appl. Phys. Lett. 70, 1685 (1997).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Zhang, X.G., Li, P., Zhao, G. et al. Removal of threading dislocations from patterned heteroepitaxial semiconductors by glide to sidewalls. J. Electron. Mater. 27, 1248–1253 (1998). https://doi.org/10.1007/s11664-998-0078-3
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/s11664-998-0078-3