Abstract
Diamond like carbon (DLC) coatings were deposited on silicon substrates by microwave electron cyclotron resonance (ECR) plasma CVD process using plasma of Ar and CH 4 gases under the influence of negative d.c. self bias generated on the substrates by application of RF (13·56 MHz) power. The negative bias voltage was varied from −60 V to −150 V during deposition of DLC films on Si substrate. Detailed X-ray reflectivity (XRR) study was carried out to find out film properties like surface roughness, thickness and density of the films as a function of variation of negative bias voltage. The study shows that the DLC films constituted of composite layer i.e. the upper sub surface layer followed by denser bottom layer representing the bulk of the film. The upper layer is relatively thinner as compared to the bottom layer. The XRR study was an attempt to substantiate the sub-plantation model for DLC film growth.
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Acknowledgements
The authors thank UGC-DAE Consortium for Scientific Research, for the X-ray diffraction facility. (RMD) and (SBS) would like to acknowledge the financial support given by the Department of Atomic Energy, Government of India, by awarding research fellowships to them during the course of the work reported here and (SKK) thanks UGC, India, for continuous support.
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DEY, R.M., DESHPANDE, S.K., SINGH, S.B. et al. X-ray reflectivity study of bias graded diamond like carbon film synthesized by ECR plasma. Bull Mater Sci 36, 9–14 (2013). https://doi.org/10.1007/s12034-013-0442-7
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DOI: https://doi.org/10.1007/s12034-013-0442-7