Abstract
Synthesis of nanoparticles in insulators attracts tremendous attention due to their unique electrical and optical properties. Here, the gallium (Ga) and gallium nitride (GaN) nanoclusters have been synthesized in the silicon nitride matrix by sequential ion implantation (gallium and nitrogen ions) followed by either furnace annealing (FA) or rapid thermal annealing (RTA). The presence of Ga and GaN nanoclusters has been confirmed by Fourier-transform infrared, Raman and X-ray photoelectron spectroscopy. Thereafter, the effect of RTA and FA on the conduction of charge carriers has been studied for the fabricated devices. It is found from the current–voltage measurements that the carrier transport is controlled by the space charge limited current conduction mechanism, and the observed values of parameter m (trap density and the distribution of localized state) for the FA and RTA devices are ~2 and ~4.1, respectively. This reveals that more defects are formed in the RTA device and that FA provides better performance than RTA from the viewpoint of opto- and nano-electronic applications.
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References
Morkoç H (ed) 2009 Handbook of nitride semiconductors and devices, GaN-based optical and electronic devices (Weinheim: Wiley-VCH Verlag GmbH)
Kumar M, Roul B, Bhat T N, Rajpalke M K, Misra P, Kukreja L M et al 2010 Mater. Res. Bull. 45 1581
Kumar M, Rajpalke M K, Roul B, Bhat T N, Sinha N, Kalghatgi A T et al 2011 Appl. Surf. Sci. 257 2107
Appleton B R, Naramoto H, White C W, Holland O W, McHargue C J, Farlow G et al 1984 Nucl. Instrum. Methods Phys. Res., Sect. B 1 167
Van Hassel B A and Burggraaf A J 1989 Appl. Phys. A 49 33
White C W, Boatner L A, Sklad P S, McHargue C J, Rankin J, Farlow G C et al 1988 Nucl. Instrum. Methods Phys. Res., Sect. B 32 11
Lamb D R (ed) 1967 Electrical conduction mechanisms in thin insulating films (London: Methuen and Co. Ltd)
Gibbons J F 1972 Proc. IEEE 60 1062
Naramoto H, White C W, Williams J M, McHargue C J, Holland O W, Abraham M M et al 1983 J. Appl. Phys. 54 683
McHargue C J, Lewis M B, Appleton B R, Naramoto H, White C W and Williams J M 1983 in Science of hard materials R K Viswanadham, D J Rowcliffe and J Gurland (eds) (Boston: Springer) p 451
McHargue C J 1987 Nucl. Instrum. Methods Phys. Res., Sect. B 19 797
McHargue C J, Kossowsky R and Hofer W O (eds) 2012 Structure–property relationships in surface-modified ceramics (Netherlands: Springer)
Bolse W and Peteves S D 1992 Nucl. Instrum. Methods Phys. Res., Sect. B 68 331
Ohkubo M, Hioki T and Kawamoto J 1987 J. Appl. Phys. 62 3069
Burnett P J and Page T F 1984 J. Mater. Sci. 19 3524
Fleuster M, Buchal C, Snoeks E and Polman A 1994 Appl. Phys. Lett. 65 225
Rajamani S, Korolev D, Belov A, Surodin S, Nikolitchev D, Okulich E et al 2016 RSC Adv. 6 74691
Borsella E, Garcia M A, Mattei G, Maurizio C, Mazzoldi P, Cattaruzza E et al 2001 J. Appl. Phys. 90 4467
Komarov F, Vlasukova L, Greben M, Milchanin O, Zuk J, Wesch W et al 2013 Nucl. Instrum. Methods Phys. Res., Sect. B 307 102
Korolev D S, Mikhaylov A N, Belov A I, Konakov A A, Vasiliev V K, Nikolitchev D E et al 2017 Int. J. Nanotechnol. 14 637
Korolev D S, Mikhaylov A N, Belov A I, Vasiliev V K, Guseinov D V, Okulich E V et al 2016 Semiconductors 50 271
Ziegler J F, Ziegler M D and Biersack J P 2010 Nucl. Instrum. Methods Phys. Res., Sect. B 268 1818
Boryakov A V, Surodin S I, Kryukov R N, Nikolichev D E and Zubkov S Y 2018 J. Electron Spectrosc. Relat. Phenom. 229 132
Huantao D, Wenping G, Jincheng Z, Yue H, Chi C, Jinyu N et al 2009 J. Semicond. 30 073001
Mayer J W 1968 IEEE Trans. Nucl. Sci. 15 10
Eisen F H and Chadderton L T (eds) 1971 Ion implantation (New York: Gordon and Breach Science Publishers)
Mayer J W 1973 IEEE International Electron Devices Meeting p 3
Yanagiya S and Ishida M 1999 J. Electron. Mater. 28 496
Joung D, Chunder A, Zhai L and Khondaker S I 2010 Appl. Phys. Lett. 97 093105
Burr T A, Seraphin A A, Werwa E and Kolenbrander K D 1997 Phys. Rev. B 56 4818
Sze S M (ed) 1981 Physics of semiconductor devices (N. Y.: Wiley)
Chiu F C 2014 Adv. Mater. Sci. Eng. 2014 1
Wagle S and Shirodkar V 2000 Braz. J. Phys. 30 380
Orwa J O, Shannon J M, Gateru R G and Silva S R P 2005 J. Appl. Phys. 97 023519
Lampert M A and Mark P (eds) 1970 Current injection in solids (New York, London: Academic Press)
Kwan C P, Street M, Mahmood A, Echtenkamp W, Randle M, He K et al 2019 AIP Adv. 9 055018
Rose A 1955 Phys. Rev. 97 1538
Mott N F and Davis E A (eds) 2012 Electronic processes in non-crystalline materials (Oxford: Oxford University Press)
Kao K C (ed) 2004 Dielectric phenomena in solids (Amsterdam: Academic Press) p 327
Scott J F 2014 J. Phys.: Condens. Matter 26 142202
Mark P and Helfrich W 1962 J. Appl. Phys. 33 205
Acknowledgements
The study was supported by the Ministry of Education and Science of the Russian Federation (RFMEFI58414X0008) and the Department of Science and Technology, India (INT/RUS/RMES/P-04/2014). The Raman spectroscopy study was performed at the Laboratory of Functional Nanomaterials (Lobachevsky University).
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RAJBHAR, M.K., RAJAMANI, S., SINGH, S.K. et al. Gallium nitride nanocrystal formation in Si3N4 matrix by ion synthesis. Bull Mater Sci 43, 234 (2020). https://doi.org/10.1007/s12034-020-02181-9
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DOI: https://doi.org/10.1007/s12034-020-02181-9