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Design of photosensitive microstructured polymer optical fibers

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Abstract

We propose a new hole-assisted polymer optical fiber design to eliminate the influence of dopant diffusion and to increase the ultra violet (UV) writing efficiency in fiber Bragg grating inscription. The optical waveguide is formed inside a solid core polymethyl methacrylate (PMMA) doped with photosensitive trans-4-stilbenemethanol, surrounded by a ring of three large air holes with double cladding. We determined a map of the single-mode and multi-mode phase transitions using a finite-element-based vectorial optical mode solver. A wide range of geometrical configurations for the single-transverse-mode (HE11) propagation in the visible was obtained. The design is optimized to operate at the low optical loss wavelengths of 580 and 770 nm.

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Authors and Affiliations

  1. Photonics Research Centre, Department of Electrical Engineering, The Hong Kong Polytechnic University, Hong Kong, China

    Hwa-Yaw Tam, Kei-Chun Davis Cheng, Guiyao Zhou & Ming-Leung Vincent Tse

  2. Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinhuangdao, 066004, China

    Guiyao Zhou

Authors
  1. Hwa-Yaw Tam
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  2. Kei-Chun Davis Cheng
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  3. Guiyao Zhou
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  4. Ming-Leung Vincent Tse
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Correspondence to Hwa-Yaw Tam.

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Tam, HY., Cheng, KC.D., Zhou, G. et al. Design of photosensitive microstructured polymer optical fibers. Front. Optoelectron. China 3, 92–98 (2010). https://doi.org/10.1007/s12200-009-0080-2

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  • DOI: https://doi.org/10.1007/s12200-009-0080-2

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