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Nanoimprint lithography for high-throughput fabrication of metasurfaces

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Abstract

Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties that are not found in nature. They have been widely investigated for optical applications such as holograms, wavefront shaping, and structural color printing, however, electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity. Although alternative optical technologies, such as holographic lithography and plasmonic lithography, can overcome these drawbacks, such methods are still constrained by the optical diffraction limit. To break through this fundamental problem, mechanical nanopatterning processes have been actively studied in many fields, with nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve sufficiently high productivity and patterning resolution, giving rise to an explosive development in the fabrication of metasurfaces. In this review, we focus on various NIL technologies for the manufacturing of metasurfaces. First, we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces. We also discuss recent applications of NIL in the realization of metasurfaces. Finally, we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.

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Acknowledgements

This work was financially supported by the National Research Foundation (NRF) grant (NRF-2019R1A2C3003129) funded by the Ministry of Science and ICT, Republic of Korea. T.L. acknowledges the NRF Global Ph.D. fellowship (NRF-2019H1A2A1076295) funded by the Ministry of Education, Republic of Korea.

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  1. These authors contributed equally to this work.

Authors and Affiliations

  1. Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea

    Dong Kyo Oh, Taejun Lee, Byoungsu Ko, Trevon Badloe & Junsuk Rho

  2. Department of Mechanical and Automotive Engineering, Seoul National University of Science and Technology (SEOULTECH), Seoul, 01811, Republic of Korea

    Jong G. Ok

  3. Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Republic of Korea

    Junsuk Rho

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  1. Dong Kyo Oh
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Dong Kyo Oh obtained his B.S. (2017) and M.S. (2019) degrees in Mechanical and Automotive Engineering from Seoul National University of Science and Technology (SEOULTECH), Republic of Korea. Currently, he is a Ph.D. student in Mechanical Engineering at Pohang University of Science and Technology (POSTECH), Republic of Korea. His research is mainly focused on flat optics based on metasurfaces, nanofabrication of metamaterials, and alternative nanofabrication.

Taejun Lee obtained his B.S. degree in Mechanical Engineering from Gachon University, Republic of Korea, in 2017. He is currently an M.S./Ph.D. integrated student in Mechanical Engineering at POSTECH, Republic of Korea. His research interest is novel lithography and dielectric metasurfaces.

Byoungsu Ko obtained his B.S. degree in Mechanical Engineering from Myongji University, Republic of Korea, in 2019. Currently, he is an M.S./Ph.D. integrated student in Mechanical Engineering at POSTECH, Republic of Korea. His research interests focus on nanofabrication and tunable metasurfaces.

Trevon Badloe obtained his M.Phys. (hons) degree (2012) from The University of Sheffield, United Kingdom with one-year study abroad at National University of Singapore, Singapore (2010). After three years of teaching courses in English and classical mechanics as an assistant professor at Yeungjin University, Republic of Korea, he started working towards his Ph.D. in Mechanical Engineering at POSTECH, Republic of Korea (2017). His research interests include tunable metamaterials and metasurfaces, and machine learning for the design and optimization of nanophotonic applications.

Jong G. Ok is currently an associate professor in the Department of Mechanical and Automotive Engineering at SEOULTECH, Republic of Korea. He received his B.S. (2002) and M.S. (2007) degrees in Mechanical and Aerospace Engineering from Seoul National University, Republic of Korea, and Ph.D. (2013) degree in Mechanical Engineering from the University of Michigan, USA. His research focuses on smart and scalable nanomanufacturing and multiscale hybrid nanoarchitecturing.

Junsuk Rho is currently a Mu-En-Jae endowed chair associate professor with a joint appointment in Mechanical Engineering and Chemical Engineering at POSTECH, Republic of Korea. He received his B.S. (2007), M.S (2008), Ph.D. (2013) degrees all in Mechanical Engineering from Seoul National University, University of Illinois, Urbana-Champaign, University of California, Berkeley, respectively. His research is focused on developing novel nanophotonic materials and devices based on fundamental physics and experimental studies of deep sub-wavelength light-matter interaction.

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Oh, D.K., Lee, T., Ko, B. et al. Nanoimprint lithography for high-throughput fabrication of metasurfaces. Front. Optoelectron. 14, 229–251 (2021). https://doi.org/10.1007/s12200-021-1121-8

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