Abstract
The preparation of high-precision nanostructures is an advanced technology in the scientific community and has very important application prospects. This paper first reviews the current lithography methods that can be used in the preparation of nanostructures in the scientific community and discusses their limitations and development trends. Next, the high-resolution scanning probe lithography (SPL) technology that can be used for sub-tenth-level precision lithography is introduced, and the SPL is mainly divided into three parts according to different processing properties while fully demonstrating that it is superior to other methods. Then, their principles, research status, advantages and disadvantages are also outlined in every section. Finally, the existing problems of scanning probe microscope the future development direction of SPL are pointed out.
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References
Albisetti E, Petti D, Pancaldi M, Madami M, Tacchi S, Curtis J, King WP, Papp A, Csaba G, Porod W, Vavassori P, Riedo E, Bertacco R (2016a) Nanopatterning reconfigurable magnetic landscapes via thermally assisted scanning probe lithography. Nanotechnology 11:545–551. https://doi.org/10.1038/nnano.2016.25
Albisetti E, Carroll KM, Lu X, Curtis JE, Petti D (2016b) Thermochemical scanning probe lithography of protein gradients at the nanoscale. Nanotechnology 27:315302. https://doi.org/10.1088/0957-4484/27/31/315302
Bartolo PJ, Mitchell G (2003) Stereo-thermal-lithography: a new principle for rapid prototyping. Rapid Prototyp J 9:150–156. https://doi.org/10.1108/13552540310477454
Bauer E (1994) Low-energy electron microscopy. Rep Prog Phys 57:895–938. https://doi.org/10.1088/0034-4885/57/9/002
Bishop D (2010) Nanotechnology and the end of Moore's Law? Bell Labs Tech J 10:23–28. https://doi.org/10.1002/bltj.20117
Chen L, Wei X, Zhou X, Xie Z, Li K, Ruan Q, Chen C, Wang J, Mirkin CA, Zheng Z (2017) Large-area patterning of metal nanostructures by dip-pen nanodisplacement lithography for optical applications. Small 13:1702003. https://doi.org/10.1002/smll.201702003
Dawood F, Wang J, Schulze PA, Sheehan CJ, Buck MR, Dennis AM, Majumder S, Krishnamurthy S, Ticknor M, Staude I, Brener I, Goodwin PM, Amro NA, Hollingsworth JA (2018) The role of liquid ink transport in the direct placement of quantum dot emitters onto sub-micrometer antennas by dip-pen nanolithography. Small 14:1801503. https://doi.org/10.1002/smll.201801503
Diagne CT, Brun C, Gasparutto D, Baillin X, Tiron R (2016) DNA origami mask for sub-ten-nanometer lithography. ACS Nano 10:6458. https://doi.org/10.1021/acsnano.6b00413
Ding L, Li Y, Chu H, Li X, Liu J (2005) Creation of cadmium sulfide nanostructures using AFM dip-pen nanolithography. J Phys Chem B 109:22337–22340. https://doi.org/10.1021/jp053389r
Dong R, Tan Y (2009) A modified prandtl–ishlinskii modeling method for hysteresis. Phys B 404:1336–1342. https://doi.org/10.1016/j.physb.2008.12.024
Ferain I, Colinge CA, Colinge J (2011) Multigate transistors as the future of classical metal–oxide-semiconductor field-effect transistors. Nature 479:310. https://doi.org/10.1038/nature10676
Garcia R, Knoll AW, Riedo E (2014) Advanced scanning probe lithography. Nanotechnology 9:577–587. https://doi.org/10.1038/nnano.2014.157
Garno JC, Yang Y, Amro NA, Cruchon-Dupeyrat S, Chen S, Liu G (2003) Precise positioning of nanoparticles on surfaces using scanning probe lithography. Nano Lett 3:389–395. https://doi.org/10.1021/nl025934v
Geppert L (2000) Quantum transistors: toward nanoelectronics. IEEE Spectr 37:46–51. https://doi.org/10.1109/6.866283
Ginger DS, Zhang H, Mirkin CA (2010) The evolution of dip-pen nanolithography. Angew Chem 43:30–45. https://doi.org/10.1002/anie.200300608
Gottlieb S, Lorenzoni M, Evangelio L, Fernández-Regúlez M, Ryu YK, Rawlings C, Spieser M, Knoll AW, Perez-Murano F (2017) Thermal scanning probe lithography for the directed self-assembly of block copolymers. Nanotechnology 28:175301. https://doi.org/10.1088/1361-6528/aa673c
Harman TC, Taylor PJ, Walsh MP, LaForge BE (2002) Quantum dot superlattice thermoelectric materials and devices. Science 297:2229–2232. https://doi.org/10.1126/science.1072886
He X, Li P, Liu P, Zhang X, Zhou X, Liu W, Qiu X (2018) Nanopatterning on calixarene thin films via low-energy field-emission scanning probe lithography. Nanotechnology 29:325301. https://doi.org/10.1088/1361-6528/aac559
Janaideh MA, Rakheja S, Su CY (2009) A generalized prandtl–ishlinskii model for characterizing the hysteresis and saturation nonlinearities of smart actuators. Smart Mater Struct 18:045001. https://doi.org/10.1088/0964-1726/18/4/045001
Jiang H, Ji H, Qiu J, Chen Y (2010) A modified prandtl-ishlinskii model for modeling asymmetric hysteresis of piezoelectric actuators. IEEE Trans Ultrason Ferroelectr Freq Control 57:1200–1210. https://doi.org/10.1109/TUFFC.2010.1533
Kaestner M, Rangelow IW (2012) Scanning probe nanolithography on calixarene. Microelectron Eng 97:96–99. https://doi.org/10.1016/j.mee.2012.05.042
Kaestner M, Nieradka K, Ivanov T, Lenk S, Krivoshapkina Y, Ahmad A, Angelov T, Guliyev E, Reum A, Budden M, Hrasok T, Hofer M, Neuber C, Rangelow IW (2014) Electric field scanning probe lithography on molecular glass resists using self-actuating, self-sensing cantilever. In: Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490C. https://doi.org/10.1117/12.2046973
Kandemir AC, Erdem D, Niederberger M, Spolenak R (2016) Polymer nanocomposite patterning by dip-pen nanolithography. Nanotechnology 27:135303. https://doi.org/10.1088/0957-4484/27/13/135303
Laing S, Suriano R, Lamprou DA, Smith C, Dalby MJ, Mabbott S, Faulds K, Graham D (2016) Thermoresponsive polymer micropatterns fabricated by dip-pen nanolithography for a highly controllable substrate with potential cellular applications. ACS Appl Mater Interfaces 8:24844–24852. https://doi.org/10.1021/acsami.6b03860
Lee KB, Park SJ, Mirkin CA, Smith JC, Mrksich M (2002) Protein nanoarrays generated by dip-pen nanolithography. Science 295:1702–1705. https://doi.org/10.1126/science.1067172
Lee JH, Najeeb CK, Nam GH, Shin Y, Lim JH, Kim JH (2016) Large-scale direct patterning of aligned single-walled carbon nanotube arrays using dip-pen nanolithography. Chem Mate 28:6471–6476. https://doi.org/10.1021/acs.chemmater.6b01075
Lenk S, Kaestner M, Lenk C, Angelov T, Krivoshapkina Y, Rangelow IW (2016) 2D simulation of fowler-nordheim electron emission in scanning probe lithography. J Nanomater Mol Nanotechnol 5:6. https://doi.org/10.4172/2324-8777.1000201
Li J, Lu C, Maynor B, Huang S, Liu J (2004) Controlled growth of long gan nanowires from catalyst patterns fabricated by “dip-pen” nanolithographic techniques. Chem Mater 16:1633–1636. https://doi.org/10.1021/cm0344764
Lundstrom M (2003) Moore's law forever? Science 299:210–211. https://doi.org/10.1126/science.1079567
Mamin HJ, Rugar D (1992) Thermomechanical writing with an atomic force microscope tip. Appl Phys Lett 61:1003–1005. https://doi.org/10.1063/1.108460
Mazzola L (2003) Commercializing nanotechnology. Nat Biotechnol 21:1137–1143. https://doi.org/10.1038/nbt1003-1137
Mokaberi B, Requicha AAG (2008) Compensation of scanner creep and hysteresis for afm nanomanipulation. Autom Sci Eng IEEE Trans 5:197–206. https://doi.org/10.1109/tase.2007.895008
Nger WB, Kley EB, Schnabel B, Stolberg I, Zierbock M, Plontke R (1995) Low-energy lithography; energy control and variable energy exposure. Microelectron Eng 27:135–138. https://doi.org/10.1016/0167-9317(94)00073-4
Novoselov KS, Jiang Z, Zhang Y, Morozov SV, Stormer HL, Zeitler U, Maan JC, Boebinger GS, Kim P, Geim AK (2007) Room-temperature quantum hall effect in graphene. Science 315:1379–1379. https://doi.org/10.1126/science.1137201
Paul P, Knoll AW, Holzner F, Duerig UT (2012) Field stitching in thermal probe lithography by means of surface roughness correlation. Nanotechnology 23:385307. https://doi.org/10.1088/0957-4484/23/38/385307
Pimpin A, Srituravanich W (2012) Disposable paper-based electrochemical sensor utilizing inkjet-printed Polyaniline modified screen-printed carbon electrode for ascorbic acid detection. Engineering Journal 16:37–56. https://doi.org/10.1016/j.jelechem.2012.08.039
Piner RD, Zhu J, Xu F, Hong S, Mirkin CA (1999) “Dip-pen” nanolithography. Science 283:661–663. https://doi.org/10.1126/science.283.5402.661
Rangelow IW, Ahmad A, Ivanov T, Kaestner M, Krivoshapkina Y, Angelov T, Lenk S, Lenk C, Ishchuk V, Hofmann M, Nechepurenko D, Atanasov I, Volland B, Guliyev E, Durrani Z, Jones M, Wang C, Liu D, Reum A, Holz M, Nikolov N, Majstrzyk W, Gotszalk T, Staaks D, Dallorto S, Olynick DL (2016) Pattern-generation and pattern-transfer for single-digit nano devices. J Vac Sci Technol B Nanotechnol Microelectron 34:06K202. https://doi.org/10.1116/1.4966556
Salaita K, Wang Y, Mirkin CA (2007) Applications of dip-pen nanolithography. Nanotechnology 2:145–155. https://doi.org/10.1038/nnano.2007.39
Shaw JE, Stavrinou PN, Anthopoulos TD (2013) On-demand patterning of nanostructured pentacene transistors by scanning thermal lithography. Adv Mater 25:552–558. https://doi.org/10.1002/adma.201202877
Thompson SE, Parthasarathy S (2006) Moore's law: the future of Si microelectronics. Mater Today 9:20–25. https://doi.org/10.1016/S1369-7021(06)71539-5
Tilke A, Vogel M, Simmel F, Kriele A, Blick RH, Lorenz H, Wharam DA, Kotthaus JP (1999) Low-energy electron-beam lithography using calixarene. J Vac Sci Technol B Microelectron Nanometer Struct 17:1594–1597. https://doi.org/10.1116/1.590795
Tseng AA, Notargiacomo A, Chen TP (2008) Nanofabrication be scanning probe microscope lithography: a review. J Vac Sci Technol b 23:877–894. https://doi.org/10.1116/1.1926293
Wolf H, Rawlings C, Mensch P, Hedrick JL, Coady DJ, Duerig U, Knoll AW (2015) Sub-20 nm silicon patterning and metal lift-off using thermal scanning probe lithography. J Vac Sci Technol B Nanotechnol Microelectron 33:02B102. https://doi.org/10.1116/1.4901413
Wu J, Yin-Lin S, Kitt R, Harold S, Boqun D (2013) A nanotechnology enhancement to Moore's law. Appl Comput Intell Soft Comput 2013:1–13. https://doi.org/10.1155/2013/426962
Yang SM, Jang SG, Choi D, Kim S, Yu HK (2010) Nanomachining by colloidal lithography. Small 2:458–475. https://doi.org/10.1002/smll.200500390
Yang P, Hook TB, Oldiges PJ, Doris BB (2016) Vertical slit FET at 7-nm node and beyond. IEEE T Electron Dev 63:3327–3334. https://doi.org/10.1109/TED.2016.2577629
Zheng X, Calò A, Albisetti E, Liu X, Alharbi ASM, Arefe G, Liu X, Spieser M, Yoo WJ, Taniguchi T, Watanabe K, Aruta C, Ciarrocchi A, Kis A, Lee BS, Lipson M, Hone J, Shahrjerdi D, Riedo E (2019) Patterning metal contacts on monolayer MoS 2 with vanishing Schottky barriers using thermal nanolithography. Nat Electron 2:17–25. https://doi.org/10.1038/s41928-018-0191-0
Zohar M, Azulay AR, Bykhovsky D, Fradkin Z, Tapuchi S, Auslender M (2017) PDMS deposition for optical devices by dip-pen nanolithography. Macromol Mater Eng 302:1700053. https://doi.org/10.1002/mame.201700053
Acknowledgements
This work was supported by the National Nature Science Foundation of China (Grant Nos. 61604019, 11704263).
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Xu, K., Chen, J. High-resolution scanning probe lithography technology: a review. Appl Nanosci 10, 1013–1022 (2020). https://doi.org/10.1007/s13204-019-01229-5
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DOI: https://doi.org/10.1007/s13204-019-01229-5