Skip to main content
Log in

Copper nanowires electrodeposited in etched single-ion track templates

  • Rapid communication
  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

The replication of single-ion track templates opens up the possibility of accessing electrical properties of nanowires without using lithographic techniques. Polycarbonate foils of 30-μm thickness were irradiated with single swift heavy ions (e.g. Au 11.4 or Xe 8.3 MeV/nucleon). By controlled one-sided etching of the damage trail caused by the ion, templates containing a single conical pore were prepared. The narrow pore openings had diameters down to 25 nm and opening angles up to 2°. By electrochemical deposition of copper, single conical wires were obtained. The electric current recorded during electrodeposition reflects the geometry of the pore. The wires were provided with electrical contacts. Current–voltage measurements confirmed that their resistance was ohmic. The wires could withstand a maximum current density above 108 A/cm2.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. M.E. Toimil Molares, V. Buschmann, D. Dobrev, R. Neumann, R. Scholz, I.U. Schuchert, J. Vetter: Adv. Mater. 13, 62 (2001)

    Google Scholar 

  2. Z.-B. Zhang, X.-Z. Sun, M.S. Dresselhaus, J. Ying, J. Heremans: Phys. Rev. B 61, 4850 (2000)

    Google Scholar 

  3. Y. Cui, C. Lieber: Science 291, 851 (2001)

    Google Scholar 

  4. C.R. Martin: Science 266, 1961 (1991)

    Google Scholar 

  5. C.A. Huber, T.E. Huber, M. Sadoqi, J.A. Lubin, S. Manalis, C.B. Prater: Science 263, 800 (1994)

    CAS  Google Scholar 

  6. M.E. Toimil Molares, J. Brötz, V. Buschmann, D. Dobrev, R. Neumann, R. Scholz, I.U. Schuchert, C. Trautmann, J. Vetter: Nucl. Instrum. Methods Phys. Res., Sect. B 185, 192 (2001)

    Google Scholar 

  7. V. Raposo, J.M. Garcia, J.M. Gonzalez, M. Vazquez: J. Magn. Magn. Mater. 222, 227 (2000)

    Google Scholar 

  8. A. Blondel, B. Doudin, J.-P. Ansermet: J. Magn. Magn. Mater. 165, 34 (1997)

    Google Scholar 

  9. A. Bachtold, C. Terrier, M. Krüger, M. Henry, T. Hoss, C. Strunk, R. Huber, H. Birk, U. Staufer, C. Schönenberger: Microelectron. Eng. 41/42, 571 (1998)

    Google Scholar 

  10. A. Fert, L. Piraux: J. Magn. Magn. Mater. 200, 338 (1999)

    Google Scholar 

  11. C. Trautmann, S. Bouffard, R. Spohr: Nucl. Instrum. Methods Phys Res., Sect. B 116, 429 (1996); R. Spohr, P. Apel: Introduction to ion track etching at http://www.iontracktechnologies.de

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to I. Enculescu .

Additional information

PACS

61.46.+w; 81.07.-b

Rights and permissions

Reprints and permissions

About this article

Cite this article

Enculescu , I., Siwy , Z., Dobrev , D. et al. Copper nanowires electrodeposited in etched single-ion track templates. Appl Phys A 77, 751–755 (2003). https://doi.org/10.1007/s00339-003-2216-3

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00339-003-2216-3

Keywords

Navigation