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V-pits as Barriers to Diffusion of Carriers in InGaN/GaN Quantum Wells

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Abstract

The luminescence characteristics of V-pits in InGaN/GaN quantum wells (QW) correlated directly with the microstructure of the V-pits, as studied by use of transmission electron microscopy with cathodoluminescence. {10-11}-Faceted V-pits, formed in the QW, produce more intense blue-shifted emission than {0001}-plane QW. A dead emission center seems to be present at the corner of the V-pit which connects the R-plane and C-plane QW. High-resolution transmission electron microscopy revealed formation of indium-deficient QW at the corners of the V-pits. High potential barriers occur because of the lack of indium around the hexagonal V-pit; this effectively blocks diffusion of carriers into the threading dislocations known to be non-radiative recombination centers. V-pits thus have promise for improving the internal quantum efficiency of light-emitting diodes.

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References

  1. S.F. Chichibu, A. Uedono, T. Onuma, B.A. Haskell, A. Chakraborty, T. Koyama, P.T. Fini, S. Keller, S.P. Denbaars, J.S. Speck, U.K. Mishra, S. Nakamura, S. Yamaguchi, S. Kamiyama, H. Amano, I. Akasaki, J. Han, and T. Sota, Nat. Mater. 5, 810 (2006).

    Article  Google Scholar 

  2. A. Hangleiter, F. Hitzel, C. Netzel, D. Fuhrmann, U. Rossow, G. Ade, and P. Hinze, Phys. Rev. Lett. 95, 127402 (2005).

    Article  Google Scholar 

  3. C. Netzel, H. Bremers, L. Hoffmann, D. Fuhrmann, U. Rossow, and A. Hangleiter, Phys. Rev. B 76, 155322 (2007).

    Article  Google Scholar 

  4. F. Hitzel, G. Klewer, S. Lahmann, U. Rossow, and A. Hangleiter, Phys. Rev. B 72, 081309 (2005).

    Article  Google Scholar 

  5. J. Kim, Y.H. Cho, D.S. Ko, X.S. Li, J.Y. Won, E. Lee, S.H. Park, J.Y. Kim, and S. Kim, Opt. Express 22, A857 (2014).

    Article  Google Scholar 

  6. Y.F. Li, F. Yun, X.L. Su, S. Liu, W. Ding, and X. Hou, J. Appl. Phys. 116, 123101 (2014).

    Article  Google Scholar 

  7. J. Kim, J. Kim, Y. Tak, S. Chae, J.Y. Kim, and Y. Park, IEEE Electron Device Lett. 34, 1409 (2013).

    Article  Google Scholar 

  8. K. Koike, S. Lee, S.R. Cho, J. Park, H. Lee, J.S. Ha, S.K. Hong, H.Y. Lee, M.W. Cho, and T. Yao, IEEE Photonic. Technol. Lett. 24, 449 (2012).

    Article  Google Scholar 

  9. S.H. Han, D.Y. Lee, H.W. Shim, J.W. Lee, D.J. Kim, S. Yoon, Y.S. Kim, and S.T. Kim, Appl. Phys. Lett. 102, 251123 (2013).

  10. H.-L. Tsai, T.-Y. Wang, J.-R. Yang, C.-C. Chuo, J.-T. Hsu, Z.-C. Feng, and M. Shiojiri, Mater. Trans. 48, 894 (2007).

    Article  Google Scholar 

  11. N. Sharma, P. Thomas, D. Tricker, and C. Humphreys, Appl. Phys. Lett. 77, 1274 (2000).

    Article  Google Scholar 

  12. J. Bruckbauer, P.R. Edwards, T. Wang, and R.W. Martin, Appl. Phys. Lett. 98, 141908 (2011).

    Article  Google Scholar 

  13. X.H. Wu, C.R. Elsass, A. Abare, M. Mack, S. Keller, P.M. Petroff, S.P. DenBaars, and J.S. Speck, Appl. Phys. Lett. 72, 692 (1998).

    Article  Google Scholar 

  14. T. Tao, T. Zhi, B. Liu, Y. Li, Z. Zhuang, Z. Xie, D. Chen, P. Chen, R. Zhang, and Y. Zheng, Phys. Status Solidi (a) 211, 2823 (2014).

    Article  Google Scholar 

  15. J. Abell and T.D. Moustakas, Appl. Phys. Lett. 92, 091901 (2008).

    Article  Google Scholar 

  16. X.M. Wu, J.L. Liu, Z.J. Quan, C.B. Xiong, C.D. Zheng, J.L. Zhang, Q.H. Mao, and F.Y. Jiang, Appl. Phys. Lett. 104, 221101 (2014).

  17. M.-H. Doan and J. Lee, Adv. Condens. Matter Phys. 2014, 1 (2014).

    Article  Google Scholar 

  18. U. Jahn, O. Brandt, E. Luna, X. Sun, H. Wang, D.S. Jiang, L.F. Bian, and H. Yang, Phys. Rev. B 81, 125314 (2010).

    Article  Google Scholar 

  19. R. Paessler, Phys. Status Solidi (b) 216, 975 (1999).

    Article  Google Scholar 

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Acknowledgements

This research was supported by the Nano Material Technology Development Program (Green Nano Technology Development Program) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning (2011-0019984).

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Correspondence to Young-Woon Kim.

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Sheen, MH., Kim, SD., Lee, JH. et al. V-pits as Barriers to Diffusion of Carriers in InGaN/GaN Quantum Wells. J. Electron. Mater. 44, 4134–4138 (2015). https://doi.org/10.1007/s11664-015-3994-z

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  • DOI: https://doi.org/10.1007/s11664-015-3994-z

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