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Effect of Deposition Rate and Annealing on Physical Properties of In2O3 Thin Films Prepared by Spray Pyrolysis: Ultraviolet (UV) Photoconductivity Response

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Abstract

As-grown and annealed indium oxide thin films deposited by spray pyrolysis at various rates (2 mL/min, 3.5 mL/min, and 5 mL/min) on glass substrate have been studied. Field-emission scanning electron microscopy images and x-ray diffraction analysis of the samples revealed that the deposition spray rate and annealing process affected both the surface morphology and preferred orientation of the polycrystalline cubic phase of the layers. Electrical investigations confirmed presence of oxygen vacancy (V O) defects related to band tail, having minimum width in the sample deposited at the highest spray rate (5 mL/min). Ultraviolet photoconductivity results indicated that, although this sample had the highest light sensitivity, its sensitivity decreased after annealing due to increased V O defects.

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Authors and Affiliations

  1. Department of Physics, Shahrood University of Technology, Shahrood, Iran

    Khadijeh Shamsoddini & Hosein Eshghi

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  1. Khadijeh Shamsoddini
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  2. Hosein Eshghi
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Correspondence to Hosein Eshghi.

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Shamsoddini, K., Eshghi, H. Effect of Deposition Rate and Annealing on Physical Properties of In2O3 Thin Films Prepared by Spray Pyrolysis: Ultraviolet (UV) Photoconductivity Response. J. Electron. Mater. 46, 4649–4655 (2017). https://doi.org/10.1007/s11664-017-5457-1

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  • DOI: https://doi.org/10.1007/s11664-017-5457-1

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