Abstract
Highly conductive carbon-based thin films have been produced by low-energy electron irradiation. Low-energy electron irradiation at a lower density of electrons eliminates the sp3 hybridization of the carbon atoms by reducing the chemical groups on the surface. Irradiated carbon-based thin films became highly conductive layers that could be used as electrodes for optoelectronic devices. The electrical conductivity σ reached 3 × 104 S/m in the case of samples irradiated at a lower density, with a mean value between 3 × 105 S/m and 3.3 × 102 S/m for highly crystalline graphite structures. The increasing (002) peak diffraction and decreasing intensity ratio ID/IG in the Raman spectra as well as the decreasing bandgap in photoluminescence measurements demonstrated the reduction of oxygen-induced defects in these thin films.
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The authors acknowledge funding through POC-G Project MAT2IT (Contract 54/2016, SMIS code 105726, Intermediary Body-Romanian Ministry of Research and Innovation).
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Ciobotaru, C.C., Ciobotaru, I.C., Iosub, D.G. et al. Highly Conductive Carbon-Based Thin Films Produced by Low-Energy Electron Irradiation. J. Electron. Mater. 50, 5529–5541 (2021). https://doi.org/10.1007/s11664-021-09058-5
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DOI: https://doi.org/10.1007/s11664-021-09058-5