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Structural and mechanical investigations of magnetron sputtering TiO2/Ti/TiN multilayer films on Si(100) substrate

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Abstract

TiO2/Ti/TiN multicompositional coating was prepared by DC reactive magnetron sputtering (MS) at a temperature of 150°C using a combination of a Ti metal target and a pure Ar, an Ar–O2 mixture, or an Ar–N2 mixture discharge gas, onto a Silicon(100) substrate. This system represents nano-structured multilayer substrate model for biomedical application as well as substrate models to reproduce the bulk titanium surface. This substrate model (Ti/TiN/Si(100)) makes possible and easy mechanical and microscopic characterization in particular for transmission electron microscopy after biocompatible test. The model multilayer TiO2/Ti/TiN/(100) was obtained after preparation of two intermediate samples: TiN/Si(100) and Ti/TiN/Si(100). Structural (X-ray diffraction), morphological (scanning electron and atomic force microscopy) as well as mechanical (hardness and elastic modulus) studies of the MS films were performed.

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Acknowledgment

The authors would like to thank Eng. Jacques Faerber at IPCMS for SEM characterization.

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Authors and Affiliations

  1. Institut de Physique et Chimie des Matériaux de Strasbourg, UMR 7504 UDSP-CNRS, 23 rue du Loess, BP 43, 67034, Strasbourg, Cedex 2, France

    Adele Carradò & Guy Schmerber

  2. Institut Charles Sadron, UPR 22 CNRS, 23 rue du Loess, BP 84047, 67034, Strasbourg, Cedex 2, France

    Hervè Pelletier

  3. INSA de Strasbourg, 24 Bd. de la Victoire, 67084, Strasbourg, France

    Hervè Pelletier

Authors
  1. Adele Carradò
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  2. Guy Schmerber
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  3. Hervè Pelletier
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Correspondence to Adele Carradò.

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Carradò, A., Schmerber, G. & Pelletier, H. Structural and mechanical investigations of magnetron sputtering TiO2/Ti/TiN multilayer films on Si(100) substrate. J Coat Technol Res 7, 821–829 (2010). https://doi.org/10.1007/s11998-010-9287-9

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  • DOI: https://doi.org/10.1007/s11998-010-9287-9

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