Formation of magnetic nanoparticles by low energy dual implantation of Ni and Fe into SiO2
Introduction
Magnetic nanoparticles are being actively researched because they have a wide variety of potential applications that include magnetic resonance imaging contrast agents [1], [2], medical treatment and diagnostics [1], [2], waste water treatment [3], high density magnetic memory [4], [5], [6], and magnetic field sensors [7], [8], [9]. The nanoscale physics is different when compared with the bulk where the coercivity and magnetocrystalline anisotropy can depend on the nanoparticle size [10], [11], [12]. The magnon dispersion is known to change for small nanoparticles where the small nanoparticle size can lead to the opening of a magnon gap [13], [14], [15]. When the nanoparticle radius becomes small enough it is possible for the thermal energy to exceed the magnetocrystalline anisotropy energy and this leads to superparamagnetism with negligible hysteresis [16]. This can be advantageous for magnetic sensing applications where negligible hysteresis makes it easier to measure small magnetic fields. Nanostructured composites containing magnetic nanoparticles can display magnetotransport properties not seen in the bulk [7], [17], [18], [19]. For example, spin tunnelling between nanoparticles in a semiconducting matrix can lead to large magnetoresistances [17], [18], [19].
Different methods are being pursued to create magnetic nanoparticles. Most nanoparticles have been made in powder form using chemical solution methods [14], [15], [19], [20], [21], [22], [23], [24], [25], [26]. Nanoparticle composites have been made by mixing powders in polymers [27] and they have also been made by pulsed laser deposition [28], [29] and other methods [30]. Ion implantation is a relatively new method that can be used to create nanostructured magnetic materials [7], [11], [12], [31], [32], [33], [34], [35]. The advantages of ion implantation over other methods include the ability to control to high precision the depth and concentration at a nanoscale level. We have recently shown that low energy Fe ion implantation into SiO2 followed by electron beam annealing (EBA) leads to superparamagnetic Fe nanoparticles in the surface region that have a large room temperature magnetoresistance that can be useful for magnetic sensing applications [7]. A range of other magnetic nanoparticles have been made by ion implantation into SiO2 that includes Ni [11], [12], [33] and Co [12] nanoparticles. Dual implantation of Co and Pt has been reported that leads to an enhanced coercivity and magnetic remanence [12] but there have been no reports of dual Fe and Ni implantation. Implanting Fe and Ni might be expected to lead to Ni1−xFex where the bulk compound is known to display a large anisotropic magnetoresistance, low coercivity, and high permeability [16].
In this paper, we report the results from Rutherford backscattered spectrometry (RBS), transmission electron microscopy (TEM) and magnetization measurements on SiO2 films implanted with Ni and Fe ions at low energies before and after EBA. We show below that as-implanted films contain superparamagnetic nanoparticles and EBA at 1000 °C for 1 h leads to ferromagnetic order and a bimodal size distribution and a different nanoparticle depth distribution that is not seen after only Fe or Ni ion implantation and EBA.
Section snippets
Methods
Ni1−xFex nanoclusters embedded in silicon dioxide were made using low-energy implantation followed by EBA at 1000 °C under high vacuum. Implantation into 500 nm SiO2 on 0.3 mm crystalline silicon substrates was performed with the low-energy metal implanter at GNS Science [31], [36] and an implantation energy of 10 keV. The implantation of 58Ni+ was carried out first and then followed by 56Fe+ with a low current of <2 μA and pressure of 10−7 mbar. The implanted nickel fluence was 2 × 1016 at./cm2
Results and discussion
The results from DTRIM simulations of the nickel and iron concentration profiles can be seen in Fig. 1 after nickel implantation into silicon dioxide with a fluence of 2 × 1016 at./cm2 that was followed by iron implantation with a fluence of 4.5 × 1015 at./cm2. The resultant ratios of the relative concentrations of iron to nickel with depth are also plotted in Fig. 1. The simulated average estimated depth of the nickel in silicon dioxide is ∼15 nm and the maximum depth is 35 nm. The average
Conclusions
In conclusion, magnetic nanoparticles have been made by low energy Ni and Fe ion implantation into silicon dioxide films with an average Fe fraction of 0.18. The as-implanted film had superparamagnetic nanoparticles with diameters ∼4 nm, as estimated from the TEM data, in a ∼20 nm wide layer near the surface. The blocking temperature was 13 K and the resultant magnetocrystalline anisotropy energy was ∼13 × 104 J m−3 and it is in the range expected for Ni0.82Fe0.18 nanoparticles. The moment per
Acknowledgements
We acknowledge funding from the MacDiarmid Institute for Advanced Materials and Nanotechnology and MBIE (C08X01206). We thank Jerome Leveneur for assistance in setting up the ion beam implanter, Chris Purcell for technical assistance with ion beam analysis measurements and Peter Murmu for assistance with ion beam analysis measurements and analysis.
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