Skip to main content
SpringerLink
Log in

Electroless deposition of Ni–B, Co–B and Ni–Co–B alloys using dimethylamineborane as a reducing agent

  • Published:
Journal of Applied Electrochemistry Aims and scope Submit manuscript

Abstract

Fundamental aspects of electroless Ni–B, Co–B and Ni–Co–B alloys have been systematically examined. The composition, crystal structure and deposition rate of the alloys were determined as a function of the concentration of reducing agent (dimethylamineborane) and complexing agents (tartrate, citrate, malonate and succinic acid), bath pH and Ni2+/Co2+ ratio. Changes in the deposition rate and metallurgical features of the alloys induced by the change in plating parameters are discussed, based on electrochemical polarization data and the formation enthalpy of the nickel and cobalt borides.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. H. Hotta, K. Suzuki, M. Watanabe and H. Honma, J. Metal Fin. Soc., Jpn 44 (1993) 831.

    Google Scholar 

  2. D. W. Bandrand, Plat. Surf. Finish. 71 (1984) 72.

    Google Scholar 

  3. L. G. Bhatgadde and S. Mahapatra, Metal Finish. 86 (1988) 31.

    Google Scholar 

  4. E. Schmeling, Metalloberflache 41 (1987) 353.

    Google Scholar 

  5. S. Mizumoto, T. Nawafune and K. Matsumoto, J. Metal Fin. Soc., Jpn 41 (1990) 907.

    Google Scholar 

  6. S. Omori and Y. Hashimoto, Powder & Powder Metall. 20 (1973) 80.

    Google Scholar 

  7. K. Koyama and Y. Hasimoto, J. Japan Inst. Metals 53 (1989) 1129.

    Google Scholar 

  8. W. Thomas Evans and M. Schlesinger, J. Electrochem. Soc. 141 (1994) 78.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Industrial Research Institute of Tochigi Prefecture, Shirakuwada, Kanuma, Tochigi, 322, Japan

    T. Saito & E. Sato

  2. Department of Chemistry, Faculty of Science and Engineering, Ritsumeikan University, Noji-cho, Kusatsu, Shiga, 525, Japan

    M. Matsuoka

  3. Department of Applied Chemistry, College of Engineering, Osaka Prefecture University, Gakuen-cho, Sakai, Osaka, 593, Japan

    C. Iwakura

Authors
  1. T. Saito
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. E. Sato
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. M. Matsuoka
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. C. Iwakura
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Saito, T., Sato, E., Matsuoka, M. et al. Electroless deposition of Ni–B, Co–B and Ni–Co–B alloys using dimethylamineborane as a reducing agent. Journal of Applied Electrochemistry 28, 559–563 (1998). https://doi.org/10.1023/A:1003233715362

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1003233715362

Search

Navigation