Issue 4, 2011

High-performance low-temperature solution-processable ZnO thin film transistors by microwave-assisted annealing

Abstract

Oxide semiconductors afford a promising alternative to organic semiconductors and amorphous silicon materials in applications requiring transparent thin film transistors (TFTs). We synthesized an aqueous inorganic precursor by a direct dissolution of zinc hydroxide in ammonium hydroxide solution from which a dense and uniform ZnO semiconducting layer is achieved. Solution-processed ZnO-TFTs prepared at 140 °C by microwave irradiation have shown enhanced device characteristics of ∼1.7 cm2 V−1s−1 mobility and a ∼107 on/off current ratio, with good air stability. Spectroscopic analyses confirmed that such a device improvement originates from accelerated dehydroxylation and better crystallization at low temperature by microwave irradiation. Our results suggest that solution-processable oxide semiconductors have potential for low-temperature and high-performance applications in transparent devices.

Graphical abstract: High-performance low-temperature solution-processable ZnO thin film transistors by microwave-assisted annealing

Supplementary files

Article information

Article type
Paper
Submitted
08 Jul 2010
Accepted
05 Oct 2010
First published
22 Nov 2010

J. Mater. Chem., 2011,21, 1102-1108

High-performance low-temperature solution-processable ZnO thin film transistors by microwave-assisted annealing

T. Jun, K. Song, Y. Jeong, K. Woo, D. Kim, C. Bae and J. Moon, J. Mater. Chem., 2011, 21, 1102 DOI: 10.1039/C0JM02178D

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