Issue 12, 2012

A molten-salt route for synthesis of Si and Ge nanoparticles: chemical reduction of oxides by electrons solvated in salt melt

Abstract

Silicon is one of the major constituents of the earth's crust and, in its elemental form, the base of many semiconductor applications, including electronics and energy conversion. Downsizing Si to the nanoscale dimension extends its application to diverse fields, which, however, is often plagued by expensive and inefficient fabrication methods. We report herein a facile chemical synthetic method for Si nanoparticles from SiO2 in a liquid environment of molten metal chlorides containing magnesium. The results show that Si nanocrystals (NCs) start to grow at 550 °C in the molten salt solvent and that the growth is controllable through the adjustment of the temperature, as well as the type of salt. We also show that the method can be generalized, as illustrated by the synthesis of Ge nanoparticles at a temperature of 450 °C. The growth of NCs is interpreted in terms of the chemical reduction of oxide by electrons solvated in the molten salts.

Graphical abstract: A molten-salt route for synthesis of Si and Ge nanoparticles: chemical reduction of oxides by electrons solvated in salt melt

Supplementary files

Article information

Article type
Paper
Submitted
25 Oct 2011
Accepted
12 Jan 2012
First published
08 Feb 2012

J. Mater. Chem., 2012,22, 5454-5459

A molten-salt route for synthesis of Si and Ge nanoparticles: chemical reduction of oxides by electrons solvated in salt melt

X. Liu, C. Giordano and M. Antonietti, J. Mater. Chem., 2012, 22, 5454 DOI: 10.1039/C2JM15453F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements