Issue 23, 2016
From the journal:

RSC Advances

Growth mechanisms and origin of localized surface plasmon resonance coupled exciton effects in Cu2−xS thin films

A. Dennyson Savariraj,a   Hee-Je Kim,a   K. K. Viswanathan,b   M. Vijaykumarc  and  Kandasamy Prabakar*ac  

* Corresponding authors

a Department of Electrical and Computer Engineering, Pusan National University, San 30, Jangjeong-Dong, Gumjeong-Ku, Busan-609 735, South Korea
E-mail: prabakar@pusan.ac.kr, kprabakar@gmail.com

b UTM Centre for Industrial and Applied Mathematics, Ibnu SIna Institute for Scientifc & Industrial Research, Department of Mathematical Sciences, Faculty of Science, Universiti Teknologi Malaysia, Johor Bahru, Johor, Malaysia

c Pacific Northwest National Laboratory (PNNL), Richland, WA 99354, USA

Abstract

We have demonstrated a robust protocol to prepare Cu2−xS thin films with a controlled crystal phase and size which exhibit localized surface plasmon resonance (LSPR) coupled exciton effects by a simple template free single step wet chemical method without any surfactant. The LSPR frequency can be tuned in the Cu2−xS thin films by the growth temperature and time which controls the free carrier density. These selectively grown Cu2−xS thin films possess a tunable band gap (2.6–1.4 eV) due to the quantum size effect. The origin of the LSPR coupled exciton effects are discussed.

Graphical abstract: Growth mechanisms and origin of localized surface plasmon resonance coupled exciton effects in Cu2−xS thin films

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Article information

DOI
https://doi.org/10.1039/C5RA26744G
Article type
Paper
Submitted
14 Dec 2015
Accepted
10 Feb 2016
First published
11 Feb 2016

RSC Adv., 2016,6, 19034-19040

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Growth mechanisms and origin of localized surface plasmon resonance coupled exciton effects in Cu2−xS thin films

A. D. Savariraj, H. Kim, K. K. Viswanathan, M. Vijaykumar and K. Prabakar, RSC Adv., 2016, 6, 19034 DOI: 10.1039/C5RA26744G

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