Solution processes have been widely used in controllable patterning of zero-dimensional nanoparticles on certain substrates due to their advantages of mild conditions, low-cost fabrication and good device compatibility. Preparing high-quality micro-patterns is very important for realizing high-performance devices. However, the solution processes normally involve both the coffee ring effect and Marangoni flow caused by solvent evaporation, which make it hard for precisely patterning nanoparticles in a controllable manner, leading to nonuniform micro-patterns. Therefore, various approaches have been developed to solve the adverse effects of the coffee ring during the film-forming process. In this contribution, we have reviewed the recent progress in controllable patterning of nanoparticles using solution transfer approaches either by taking advantage of or by inhibiting the coffee ring effect, as well as the mechanism involved and the applications in various fields.