Issue 11, 1991

Faraday communications. EXAFS evidence for the formation of a V2O5 thin film by chemical vapour deposition on SiO2

Abstract

V K-edge EXAFS studies of V2O5/SiO2 catalysts prepared by a chemical vapour deposition (CVD) method demonstrate the formation of V2O5 thin films, while the V2O5 of V2O5/SiO2 prepared by an impregnation method is mainly in the form of microcrystallites.

Article information

Article type
Paper

J. Chem. Soc., Faraday Trans., 1991,87, 1807-1808

Faraday communications. EXAFS evidence for the formation of a V2O5 thin film by chemical vapour deposition on SiO2

K. Inumaru, T. Okuhara, M. Misono, N. Matsubayashi, H. Shimada and A. Nishijima, J. Chem. Soc., Faraday Trans., 1991, 87, 1807 DOI: 10.1039/FT9918701807

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Spotlight

Advertisements