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Wettability control of a plastic surface by Cf4-O2 plasma and its etching effect

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Published under licence by IOP Publishing Ltd
, , Citation M Kogoma et al 1987 J. Phys. D: Appl. Phys. 20 147 DOI 10.1088/0022-3727/20/1/022

0022-3727/20/1/147

Abstract

Any desired surface wettability of a plastic surface can be produced by changing the concentration of the plasma gas, which here is a mixture of oxygen and a compound which includes fluorine. In the plasma treatment, the use of a third electrode consisting of a metal mesh for ion trapping can significantly decrease the etching effect. The plastic surface wettability, given by the contact angle of a water drop, does not have any direct relationship with the surface roughness due to etching in this experiment.

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10.1088/0022-3727/20/1/022