Abstract
The authors report preliminary results on the use of a novel metal-organic precursor molecule-dimethyl indium ditertiarybutyl phosphine-for the co-evaporated growth of epitaxial indium phosphide by metal-organic molecular beam epitaxy. It is shown that indium-rich growth occurs at all substrate temperatures studied but that stoichiometric growth is only possible at 480 degrees C with simultaneous incident flux of dissociated phosphine.
Export citation and abstract BibTeX RIS