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Growth of (001) or (115) Bi-2201 Thin Films by Spin Coating and MOCVD Targeting Future Electronics Applications

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, , Citation K Endo et al 2014 J. Phys.: Conf. Ser. 507 012011 DOI 10.1088/1742-6596/507/1/012011

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1 Research Laboratory for Integrated Technological Systems, Kanazawa Institute of Technology (KIT), Yatsukaho, Ishikawa 924-0838, Japan

2 National Institute of Materials Physics, Magurele, Atomistilor 105bis, 077125, Romania

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1742-6596/507/1/012011

Abstract

Thin films of Bi2Sr2CuO6 (Bi-2201) with (001) or (115) orientation were grown on SrTiO3 substrates. These films are expected to be useful as component films of heterostructures and devices (e.g. as insulators). We used two chemical routes, namely spin coating followed by thermal annealing and MOCVD. For both routes we demonstrated growth of c-axis and non-c axis thin films depending on the selected orientation of the SrTiO3 substrate. To our knowledge, films of (115) Bi2201 obtained by spin coating or MOCVD are reported for the first time.

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10.1088/1742-6596/507/1/012011