Electro-Absorption Effects at the Band Edges of Silicon and Germanium

A. Frova, P. Handler, F. A. Germano, and D. E. Aspnes
Phys. Rev. 145, 575 – Published 13 May 1966
PDFExport Citation

Abstract

The change in the absorption coefficient Δα=α(ω, E)α(ω, 0) due to the presence of an electric field E has been measured for the indirect-absorption edges of silicon and germanium and for the direct-absorption edge in germanium. The results show good qualitative agreement with the theoretical predictions. The quantitative deviations are caused by the presence of excitons and thermal and electric-field broadening, which have not been taken into account in the theory. The energies of the phonons which take part in indirect optical absorption have been determined from the room-temperature data and are in very good agreement with the values found at liquid-helium temperatures by other means.

  • Received 13 December 1965

DOI:https://doi.org/10.1103/PhysRev.145.575

©1966 American Physical Society

Authors & Affiliations

A. Frova*, P. Handler, F. A. Germano, and D. E. Aspnes

  • Physics Department, Electrical Engineering Department, and the Materials Research Laboratory, University of Illinois, Urbana, Illinois

  • *Present address: Bell Telephone Laboratories, Murray Hill, New Jersey.

References (Subscription Required)

Click to Expand
Issue

Vol. 145, Iss. 2 — May 1966

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Journals Archive

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×