Study of Localized Levels in Semi-Insulators by Combined Measurements of Thermally Activated Ohmic and Space-Charge-Limited Conduction

G. G. Roberts and Fred W. Schmidlin
Phys. Rev. 180, 785 – Published 15 April 1969
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Abstract

It is shown that measurement of thermal activation energies for both Ohmic and space-charge-limited conduction over a broad temperature range enables the deduction of both depth and concentration of localized levels in a semi-insulator, while measurement of the activation energy for Ohmic conduction alone is rarely definitive for a wide band-gap material. The basis for interpreting thermal activation energies for electrical conduction is discussed in detail. The analysis is applied to recent results on HgS, GaP, CdS, and ZnS: Cd.

  • Received 11 July 1968

DOI:https://doi.org/10.1103/PhysRev.180.785

©1969 American Physical Society

Authors & Affiliations

G. G. Roberts* and Fred W. Schmidlin

  • Xerox Research Laboratories, Webster, New York 14580

  • *Present address: The School of Physical Sciences, The New University of Ulster, Coleraine, County Londonderry, Northern Ireland.

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Issue

Vol. 180, Iss. 3 — April 1969

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