Light-induced diffusion and desorption of alkali metals in a siloxane film: Theory and experiment

S. N. Atutov, V. Biancalana, P. Bicchi, C. Marinelli, E. Mariotti, M. Meucci, A. Nagel, K. A. Nasyrov, S. Rachini, and L. Moi
Phys. Rev. A 60, 4693 – Published 1 December 1999
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Abstract

The light-induced desorption and diffusion of alkali-metal atoms in organic films are interesting fields of investigation. An impressive demonstration is given by the recently observed light-induced atomic desorption (LIAD) effect, where a huge alkali-metal atom desorption from siloxane films, previously exposed to atomic vapors, is induced by weak and nonresonant light. In this paper, experimental data and a one-dimensional theoretical model of the effect are presented. The model gives a good description of the vapor density dynamics by taking into account both the atomic diffusion inside the coating and the surface desorption. General equations are reported and discussed within the limits of experimental interest. The potential barrier at the vapor-surface interface and the activation energy for Rb in (poly)dimethylsiloxane have been determined.

  • Received 29 October 1998

DOI:https://doi.org/10.1103/PhysRevA.60.4693

©1999 American Physical Society

Authors & Affiliations

S. N. Atutov*, V. Biancalana, P. Bicchi, C. Marinelli, E. Mariotti, M. Meucci, A. Nagel, K. A. Nasyrov*, S. Rachini, and L. Moi

  • INFM and Dipartimento di Fisica dell’Università degli Studi di Siena, Banchi di Sotto 55, I-53100 Siena, Italy

  • *Permanent address: Institute of Automation and Electrometry, Novosibirsk 90, Russia.
  • Permanent address: Institut für Angewandte Physik, Wegelerstrasse 8, Bonn, Germany.

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Vol. 60, Iss. 6 — December 1999

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