Controlling four-wave mixing and six-wave mixing in a multi-Zeeman-sublevel atomic system with electromagnetically induced transparency

Yigang Du, Yanpeng Zhang, Cuicui Zuo, Changbiao Li, Zhiqiang Nie, Huaibin Zheng, Meizhen Shi, Ruimin Wang, Jianping Song, Keqing Lu, and Min Xiao
Phys. Rev. A 79, 063839 – Published 25 June 2009

Abstract

We theoretically investigate the dually dressed electromagnetically induced transparency, and the multidressed four-wave mixing (FWM) and six-wave mixing (SWM) processes in an inverted-Y-type atomic system with Zeeman sublevels. The results show that the Zeeman degeneracy of the dark states can be lifted by the dressing field as its intensity is increased. Moreover, the derived analytical expressions indicate that one can, for example, selectively create secondary dark states on the multi-Zeeman-sublevel dark states (by tuning the coupling field), distinguish two different types of dark states generated in two FWM processes (by properly controlling the coupling field intensity), and selectively enhance multi-FWM signals coming from various paths consisting of split Zeeman sublevels (by tuning the dressing field). The SWM signals can be either enhanced or suppressed by controlling the dressing field.

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  • Received 3 February 2009

DOI:https://doi.org/10.1103/PhysRevA.79.063839

©2009 American Physical Society

Authors & Affiliations

Yigang Du1, Yanpeng Zhang1,*, Cuicui Zuo1, Changbiao Li1, Zhiqiang Nie1, Huaibin Zheng1, Meizhen Shi1, Ruimin Wang1, Jianping Song1, Keqing Lu3, and Min Xiao2,†

  • 1Key Laboratory for Physical Electronics and Devices of the Ministry of Education and Shaanxi Key Laboratory of Information Photonic Technique, Xi’an Jiaotong University, Xi’an 710049, China
  • 2Department of Physics, University of Arkansas, Fayetteville, Arkansas 72701, USA
  • 3State Key Laboratory of Transient Optics and Technology, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi’an 710068, China

  • *ypzhang@mail.xjtu.edu.cn
  • mxiao@uark.edu

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Vol. 79, Iss. 6 — June 2009

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