Impact of alloy disorder on Auger recombination in single InGaN/GaN core-shell microrods

W. Liu, G. Rossbach, A. Avramescu, T. Schimpke, H.-J. Lugauer, M. Strassburg, C. Mounir, U. T. Schwarz, B. Deveaud, and G. Jacopin
Phys. Rev. B 100, 235301 – Published 4 December 2019

Abstract

We study the influence of local inhomogeneities on carrier recombination dynamics in single InGaN/GaN core-shell microrods (MRs) by means of time-resolved microphotoluminescence (TRPL) at 10 K. At low carrier density (1011cm2), the carrier recombination in the m-plane quantum well is dominated by radiative processes and the recorded decay times along the MR equally amount to about 400 ps, corresponding to a bimolecular coefficient of 1.1±0.2×102cm2s1. When the excited carrier density exceeds 1012cm2, both the efficiency and the decay time of the PL in the quantum well drop significantly, which indicates the onset of Auger recombination. Based on a modified ABC model, we estimate a C coefficient varying from 0.5±0.2 to 2.2±0.9×1016cm4s1 from the lower to the upper part of the MR. This increase is accompanied by a rise of PL linewidth in the low excitation regime, indicating an increase of alloy disorder. Relaxation of the k-selection rule by alloy disorder is expected to play an important role in the observed increase of Auger coefficient. These results confirm that Auger recombination is sensitive to disorder and can be significantly enhanced in strongly disordered systems. We conclude that it is therefore crucial to minimize the degree of disorder in the active layer for high power LEDs based on core-shell MRs.

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  • Received 16 December 2018
  • Revised 24 September 2019

DOI:https://doi.org/10.1103/PhysRevB.100.235301

©2019 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

W. Liu1,*, G. Rossbach2, A. Avramescu2, T. Schimpke2, H.-J. Lugauer2, M. Strassburg2, C. Mounir3, U. T. Schwarz4, B. Deveaud1,5, and G. Jacopin1,6

  • 1Institute of Physics, École polytechnique fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • 2OSRAM Opto Semiconductors GmbH, 93055 Regensburg, Germany
  • 3Department of Microsystems Engineering (IMTEK), University of Freiburg, 79110 Freiburg, Germany
  • 4Institute of Physics, Technische Universität Chemnitz, 09126 Chemnitz, Germany
  • 5École polytechnique, 91128 Palaiseau, France
  • 6Univ. Grenoble Alpes, CNRS, Grenoble INP, Institut Néel, 38000 Grenoble, France

  • *we.liu@epfl.ch

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Vol. 100, Iss. 23 — 15 December 2019

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