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Fast nonthermal processes in pulsed laser deposition

Jeffrey G. Ulbrandt, Xiaozhi Zhang, Randall L. Headrick, Rui Liu, Matthew Dawber, and Kenneth Evans-Lutterodt
Phys. Rev. B 101, 241406(R) – Published 1 June 2020
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Abstract

Pulsed laser deposition (PLD) is widely used to grow epitaxial thin films of quantum materials. Here, we use in situ x-ray scattering to study homoepitaxy of SrTiO3 by energetic deposition (e-PLD) versus PLD thermalized by a He background gas (th-PLD). Energetic PLD suppresses the lateral growth of two-dimensional islands, which suggests that particles with kinetic energies of 100 eV break up smaller islands. Fast interlayer transport occurs for th-PLD as well as e-PLD, implying a process operating on submicrosecond time scales for incident particles with kinetic energies below 10 eV.

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  • Received 26 July 2019
  • Revised 21 April 2020
  • Accepted 20 May 2020

DOI:https://doi.org/10.1103/PhysRevB.101.241406

©2020 American Physical Society

Physics Subject Headings (PhySH)

Condensed Matter, Materials & Applied Physics

Authors & Affiliations

Jeffrey G. Ulbrandt, Xiaozhi Zhang, and Randall L. Headrick*

  • Department of Physics and Materials Science Program, University of Vermont, Burlington, Vermont 05405, USA

Rui Liu and Matthew Dawber

  • Department of Physics and Astronomy, Stony Brook University, Stony Brook, New York 11794, USA

Kenneth Evans-Lutterodt

  • National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, New York 11967, USA

  • *rheadrick@uvm.edu

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Issue

Vol. 101, Iss. 24 — 15 June 2020

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